Nanometerscale lithography with chromium atoms using light forces

Drodofsky, U.; Stühler, J.; Brezger, B.; Schulze, Th.; Drewsen, Michael; Pfau, Tilman; Mlynek, J.

doi:10.1016/s0167-9317(96)00116-5

Cited by 54 publications

(29 citation statements)

References 6 publications

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“…Potential wells of a standing light wave may serve as a periodic array of focusing elements for an atomic beam in a deposition setup. Atom lithographic schemes based on nanomanipulation of neutral atoms by laser fields have attracted a lot of attention recently [8][9][10][11][12][13], as a promising way to overcome the resolution limits of usual optical lithography. In the case of a direct laser-guided atom deposition, the diffraction resolution limit is determined by the de Broglie wavelength of atoms, and may reach several pm for typical atomic beams.…”

Section: Introductionmentioning

confidence: 99%

Squeezing of atoms in a pulsed optical lattice

Leibscher

Averbukh

2002

Phys. Rev. A

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We study the process of squeezing of an ensemble of cold atoms in a pulsed optical lattice. The problem is treated both classically and quantum-mechanically under various thermal conditions. We show that a dramatic compression of the atomic density near the minima of the optical potential can be achieved with a proper pulsing of the lattice. Several strategies leading to the enhanced atomic squeezing are suggested, compared and optimized.

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Section: Introductionmentioning

confidence: 99%

Squeezing of atoms in a pulsed optical lattice

Leibscher

Averbukh

2002

Phys. Rev. A

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“…The principle of atom lithography is based on using a standing wave (SW) of light as a mask on atoms to concentrate the atomic flux periodically and create desired patterns at the nanometer scale (for recent reviews see, [1,2]). Since the first experimental demonstration of submicron atomic structures [3], the subject has seen a considerable growth both theoretically [4][5][6][7][8] and experimentally [9][10][11][12][13][14][15]. In the direct deposition setup, periodic atomic lines of sodium [3,9], chromium [10,11], aluminum [12], ytterbium [13], and iron [14] atoms have been successfully fabricated.…”

Section: Introductionmentioning

confidence: 99%

Atom lithography with near-resonant standing waves

2010

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We study the optimal focusing of two-level atoms with a near resonant standing wave light, using both classical and quantum treatments of the problem. Operation of the focusing setup is considered as a nonlinear spatial squeezing of atoms in the thin-and thick-lens regimes. It is found that the near-resonant standing wave focuses the atoms with a reduced background in comparison with fardetuned light fields. For some parameters, the quantum atomic distribution shows even better localization than the classical one. Spontaneous emission effects are included via the technique of quantum Monte Carlo wave function simulations. We investigate the extent to which non-adiabatic and spontaneous emission effects limit the achievable minimal size of the deposited structures.

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“…In the conventional atom-lithographic schemes, a standing wave (SW) of light is used as a mask on atoms to concentrate the atomic flux periodically and create desired patterns at the nanometer scale [2]. The technique has been applied to many atomic-species in one [3][4][5][6][7][8][9][10][11] as well as two-dimensional [12] pattern formations. There are two ways to focus a parallel beam of atoms by light masks in close correspondence with conventional optics.…”

Section: Introductionmentioning

confidence: 99%

“…The laser focusing of atoms depends on parameters such as thickness of light beam, velocity spread of atoms, detuning of laser frequency from the atomic transition frequencies, etc,. Experimentally, atomic nanostructures have been reported with sodium [1,5], chromium [6,7], aluminium [8], cesium [9], ytterbium [10], and iron [11] atoms.…”

Section: Introductionmentioning

confidence: 99%

Atom nanolithography with multilayer light masks: Particle optics analysis

2005

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We study the focusing of atoms by multiple layers of standing light waves in the context of atom lithography. In particular, atomic localization by a double-layer light mask is examined using the optimal squeezing approach. Operation of the focusing setup is analyzed both in the paraxial approximation and in the regime of nonlinear spatial squeezing for the thin-thin as well as thinthick atom lens combinations. It is shown that the optimized double light mask may considerably reduce the imaging problems, improve the quality of focusing and enhance the contrast ratio of the deposited structures.

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Nanometerscale lithography with chromium atoms using light forces

Cited by 54 publications

References 6 publications

Squeezing of atoms in a pulsed optical lattice

Squeezing of atoms in a pulsed optical lattice

Atom lithography with near-resonant standing waves

Atom nanolithography with multilayer light masks: Particle optics analysis

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