2020
DOI: 10.1088/2053-1591/ab77ed
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Nanopillar and nanohole fabrication via mixed lithography

Abstract: We report a fabrication method for the production of nanopillar (NP) or nanohole (NH) arrays together with a micrometer-sized structure within a single layer. On a 200 mm silicon wafer, we produced 200-400 nm NP or NH arrays using electron beam lithography (EBL). The EBL patterns on a positive-tone EB resist-either a poly(methyl methacrylate) or chemically semi-amplified resistwere transferred to a hard mask oxide (HMO) layer using reactive-ion etching (RIE), as the first etching step. We used the HMO as an in… Show more

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Cited by 9 publications
(6 citation statements)
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“…To confirm the structure of the Au on the PET film, we performed SEM characterization by tilting-and-rotating the sample (Nam, 2018;Baek et al, 2020). Figure 2A describes the approach to visualizing the Au deposited on the side wall which is formed on the nanoimprinted PET film.…”
Section: Resultsmentioning
confidence: 99%
“…To confirm the structure of the Au on the PET film, we performed SEM characterization by tilting-and-rotating the sample (Nam, 2018;Baek et al, 2020). Figure 2A describes the approach to visualizing the Au deposited on the side wall which is formed on the nanoimprinted PET film.…”
Section: Resultsmentioning
confidence: 99%
“…The top-down fabricated 3D SERS substrates refer to well-defined metal-coated nanostructures prepared by a top-town fabrication process. In all top-down fabricated structures, nanopillar arrays with their top and/or base coated by SERS active metals enable large SERS EFs due to their multidimensional architectures with a large surface area. , Many methods have been developed for the fabrication of nanopillar arrays for SERS applications, including NSL, , EBL, , nanoimprinting lithography, , maskless reactive ion etching, , and block copolymer lithography (BCL). , …”
Section: Sers Substrate Made From 3d Nanostructuresmentioning
confidence: 99%
“…In all top-down fabricated structures, nanopillar arrays with their top and/or base coated by SERS active metals enable large SERS EFs due to their multidimensional architectures with a large surface area. 172,173 Many methods have been developed for the fabrication of nanopillar arrays for SERS applications, including NSL, 174,175 EBL, 176,177 nanoimprinting lithography, 178,179 maskless reactive ion etching, 180,181 and block copolymer lithography (BCL). 182,183 NSL and EBL allow the precise control of the geometry of substrates and subsequent plasmonic responses.…”
Section: Top-down Fabricationmentioning
confidence: 99%
“…Another work reported by Baek et al combine EBL and photolithography to fabricate two patterns of nanopillar in a single layer on a silicon wafer. 63 The pillar stands with a diameter of 450 nm and 220 nm and a depth of 1.2 μm. In this case, SiO 2 acting as hard mask oxide (HMO) was grown thermally on the wafer to connect the EBL and photolithography patterns.…”
Section: Fabrication Of Nanopillar Arrays (Npla)mentioning
confidence: 99%