Nanoporous Structure Fabrication in Selective Areas by Block Copolymer Self-Assembly and Electron Beam Lithography

Photopatterning of Block Copolymer Thin Films

“…Positive tone: Positive tone photopatterning is accomplished by either degrading one domain of the BCP ,, or by cleaving a photolabile linker that tethers the blocks together. ,− ,− These materials are effective for applications where BCP features need to be transferred into an underlying substrate, since only one development step is required to create a sacrificial template for pattern transfer.…”