Nanoscale Block Copolymer Ordering Induced by Visible Interferometric Micropatterning: A Route towards Large Scale Block Copolymer 2D Crystals

Aissou, Karim; Shaver, Jonah; Fleury, Guillaume; Pécastaings, Gilles; Brochon, Cyril; Navarro, Christophe; Grauby, Stéphane; Rampnoux, Jean‐Michel; Dilhaire, S.; Hadziioannou, Georges

doi:10.1002/adma.201203254

Cited by 43 publications

(54 citation statements)

References 21 publications

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“…Precise control of domain location has been successfully addressed using chemical [6][7][8] or topographical [9][10][11][12] patterns on the substrate. By introducing Si-or Adv.…”

mentioning

confidence: 99%

Sub‐10 nm Features Obtained from Directed Self‐Assembly of Semicrystalline Polycarbosilane‐Based Block Copolymer Thin Films

et al. 2014

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Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)-block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions.

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“…Precise control of domain location has been successfully addressed using chemical [6][7][8] or topographical [9][10][11][12] patterns on the substrate. By introducing Si-or Adv.…”

mentioning

confidence: 99%

Sub‐10 nm Features Obtained from Directed Self‐Assembly of Semicrystalline Polycarbosilane‐Based Block Copolymer Thin Films

et al. 2014

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“…It seems from the above-mentioned experimental studies [28][29][30][31][32] that, at present, there is only partial success in aligning defect-free lamellar forming BCP films as induced by substrate corrugation. On the theoretical side [33][34][35][36][37][38], previous works have been mainly devoted to study the transition between parallel to perpendicular lamellar phases in presence of a substrate.…”

Section: Introductionmentioning

confidence: 99%

Defect-Free Perpendicular Diblock Copolymer Films: The Synergy Effect of Surface Topography and Chemistry

Man¹,

Zhou

Tang³

et al. 2016

Macromolecules

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We propose a direct self-assembly mechanism towards obtaining defect-free perpendicular lamellar phases of diblock copolymer (BCP) thin films. In our numerical study, a thin BCP film having a flat top surface is casted on a uni-directional corrugated solid substrate. The substrate is treated chemically and has a weak preference toward one of the two BCP components. Employing self-consistent field theory (SCFT), we find that there is an enhanced synergy between two substrate characteristics: its topography (geometrical roughness) combined with a weak surface preference. This synergy produces the desired perpendicular lamellar phase with perfect inplane ordering. Defect-free BCP lamellar phases are reproducible for several random initial states, and are obtained for a range of substrate roughness and chemical characteristics, even for a uni-directional multi-mode substrate roughness. Our theoretical study suggests possible experiments that will explore the interplay between uni-directional substrate corrugation and chemical surface treatment. It may lead to viable and economical ways of obtaining BCP films with defect-free lateral alignment.

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“…This combination of top-down (lithographic) technology at~500 nm scale and bottom-up (BCP nanostructures) at~50 nm scale is promising for well controlled nanosurfaces, if somewhat tedious. Other substrates with specific topographies were successfully used to produce perpendicular alignment of phases of hexagonally packed cylinders: faceted crystals [11] and interferometrically produced sinusoidal polymer gratings [53], are among the interesting examples. The former case proved appropriate for very thin films, whereas the latter requires a thickness above a threshold value of several times the pattern sinusoidal amplitude and the nanostructure period.…”

Section: Graphoepitaxymentioning

confidence: 99%

Nanopatterns Produced by Directed Self-Assembly in Block Copolymer Thin Films

Ponsinet

2015

Polymer Surfaces in Motion

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Nanoscale Block Copolymer Ordering Induced by Visible Interferometric Micropatterning: A Route towards Large Scale Block Copolymer 2D Crystals

Cited by 43 publications

References 21 publications

Sub‐10 nm Features Obtained from Directed Self‐Assembly of Semicrystalline Polycarbosilane‐Based Block Copolymer Thin Films

Sub‐10 nm Features Obtained from Directed Self‐Assembly of Semicrystalline Polycarbosilane‐Based Block Copolymer Thin Films

Defect-Free Perpendicular Diblock Copolymer Films: The Synergy Effect of Surface Topography and Chemistry

Nanopatterns Produced by Directed Self-Assembly in Block Copolymer Thin Films

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