Nanoscale Engineering and E-Beam Lithography Using (S)TEM

Bell, DC

doi:10.1017/s1431927607076532

Cited by 2 publications

(2 citation statements)

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“…Beyond the imaging and microanalysis capabilities, the transmission electron microscope (TEM) has been utilized for a range of nanofabrication purposes including electron-beam (e-beam) lithography (Bell, 2007), e-beam induced deposition (Shimojo et al, 2004; van Dorp et al, 2005) and direct nanoscale machining (Humphreys et al, 1990 and references therein; Howitt et al, 2008). The high density, high energy focused electron beam in a medium to high voltage field-emission TEM offers a convenient way to directly sculpt prototype nanostructures, demonstrated earlier for various classes of materials ranging from metals to oxides (Mochel et al, 1983; Berger et al, 1987; Turner et al, 1990; Bullough, 1997).…”

Section: Introductionmentioning

confidence: 99%

The Applications ofIn SituElectron Energy Loss Spectroscopy to the Study of Electron Beam Nanofabrication

et al. 2009

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An in situ electron energy loss spectroscopy (EELS) technique has been developed to investigate the dynamic processes associated with electron-beam nanofabrication on thin membranes. In this article, practical applications germane to e-beam nanofabrication are illustrated with a case study of the drilling of nanometer-sized pores in silicon nitride membranes. This technique involves successive acquisitions of the plasmon-loss and the core-level ionization-loss spectra in real time, both of which provide the information regarding the hole-drilling kinetics, including two respective rates for total mass loss, individual nitrogen and silicon element depletion, and the change of the atomic bonding environment. In addition, the in situ EELS also provides an alternative method for endpoint detection with a potentially higher time resolution than by imaging. On the basis of the time evolution of in situ EELS spectra, a qualitative working model combining knock-on sputtering, irradiation-induced mass transport, and phase separation can be proposed.

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Section: Introductionmentioning

confidence: 99%

The Applications ofIn SituElectron Energy Loss Spectroscopy to the Study of Electron Beam Nanofabrication

et al. 2009

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“…Transmission Electron Microscopy (TEM) has been successfully employed to fabricate various sizes of solid-state nanopores in a 20 nm, 50 nm and 100nm thick silicon nitride membrane [1]. The time taken to fabricate a nanopore is ~ 1 minute for a resultant 5 nm diameter nanopore using a 200 KeV beam.…”

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confidence: 99%