2012
DOI: 10.1021/nl300228b
|View full text |Cite
|
Sign up to set email alerts
|

Nanoscale InGaSb Heterostructure Membranes on Si Substrates for High Hole Mobility Transistors

Abstract: As of yet, III-V p-type field-effect transistors (p-FETs) on Si have not been reported, due partly to materials and processing challenges, presenting an important bottleneck in the development of complementary III-V electronics. Here, we report the first high-mobility III-V p-FET on Si, enabled by the epitaxial layer transfer of InGaSb heterostructures with nanoscale thicknesses. Importantly, the use of ultrathin (thickness, ~2.5 nm) InAs cladding layers results in drastic performance enhancements arising from… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

1
83
0

Year Published

2012
2012
2018
2018

Publication Types

Select...
6
1
1

Relationship

3
5

Authors

Journals

citations
Cited by 89 publications
(84 citation statements)
references
References 28 publications
1
83
0
Order By: Relevance
“…The bottom-gate transistors (Si as the back gate) were first characterized via electrical transport measurements before being subjected to atomic-layer deposition (ALD) of a ZrO 2 film (κ ≈ 12) for a single nanotube channel transistor using a tetrakis (ethylmethylamido) zirconium precursor and water at 130°C. 24 After that, Pd gate electrodes were patterned for the top-gate structures. A schematic of the device structure is shown in Figure 1a.…”
Section: Resultsmentioning
confidence: 99%
“…The bottom-gate transistors (Si as the back gate) were first characterized via electrical transport measurements before being subjected to atomic-layer deposition (ALD) of a ZrO 2 film (κ ≈ 12) for a single nanotube channel transistor using a tetrakis (ethylmethylamido) zirconium precursor and water at 130°C. 24 After that, Pd gate electrodes were patterned for the top-gate structures. A schematic of the device structure is shown in Figure 1a.…”
Section: Resultsmentioning
confidence: 99%
“…Recently, there has been a high level of interest in exploring the fundamental science (6-10) and associated devices (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) (19) or diamond/zincblend structures InAs (12) and InGaSb (20)] can be readily mounted on virtually any support substrate, thereby enabling a wide range of novel device concepts and practical applications. In one example system, InAs quantum membranes (QMs) with adjustable thicknesses down to a few atomic layers have been realized by a layer transfer process onto a user-defined substrate (12).…”
mentioning
confidence: 99%
“…For the purpose of this work we investigate InAs/(Ga,InAs)Sb type II superlattices (T2SLs) and AlInSb/InSb quantum wells (QWs), but our approach is readily applicable to any Sb-containing heterostructure. We demonstrate that wet and dry techniques (17,18) (i.e., transfer in liquid or mediated by a stamp, respectively) yield successful transfer of T2SL membranes with thickness ranging from 100 nm to 2.5 µm, and lateral sizes going from 24 × 24 µm 2 to 1 × 1 cm 2 . We bond InAs/(InAs,Ga)Sb T2SLs to a large variety of hosts, including elastomers and rigid substrates, and both insulating and semiconducting substrates.…”
mentioning
confidence: 95%
“…In this scenario we establish a versatile process to release and transfer Sb-based heterostructures from their epitaxial growth substrate to any host, resulting in fabrication of freestanding membranes (17,18). Despite the numerous demonstrations of membrane technology applied to III-V semiconductors (18-26), fabrication and detailed characterization of Sb compounds in membrane form has not been reported.…”
mentioning
confidence: 99%
See 1 more Smart Citation