1998
DOI: 10.1116/1.581294
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Nanoscale scratch resistance of ultrathin protective overcoats on hard magnetic disks

Abstract: Deposition and properties of tetrahedral amorphous carbon films prepared on magnetic hard disks Subnanometer scale tribological properties of nitrogen containing carbon coatings used in magnetic storage devices J.Structural and tribological characterization of protective amorphous diamond-like carbon and amorphous CN x overcoats for next generation hard disks

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Cited by 28 publications
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“…In all cases, the deposited coatings are amorphous, containing hydrogen to saturate the dangling carbon bonds and to prevent oxidation, and containing nitrogen to improve the overcoat durability [1]. Recently, we have proposed the use of an alternative nanostructured carbon-based coating [2].…”
Section: Introductionmentioning
confidence: 99%
“…In all cases, the deposited coatings are amorphous, containing hydrogen to saturate the dangling carbon bonds and to prevent oxidation, and containing nitrogen to improve the overcoat durability [1]. Recently, we have proposed the use of an alternative nanostructured carbon-based coating [2].…”
Section: Introductionmentioning
confidence: 99%
“…1 For example, both AFM and DSI have been used to measure mechanical properties, such as hardness and elastic modulus, of materials using nanoscale indentation [2][3][4] and to investigate the scratch resistance of diamond-like carbon coatings using nanoscale scratch and wear testing techniques. [5][6][7][8] However, only in a few instances 3,9 has the indentation and scratch behavior of polymeric materials been studied with submicrometer spatial resolution.…”
Section: Introductionmentioning
confidence: 99%
“…[5][6][7][8] In general during an AFM scratch test, the probe tip moves toward the sample, contacts and penetrates into the sample surface, moves laterally across the sample, and then lifts off of the sample surface. Concurrently, deflection of the cantilever probe is measured, often by using an optical lever system.…”
Section: Introductionmentioning
confidence: 99%
“…There have been a number of approaches geared to the use of SPM-based techniques in lithographic applications. One of the earlier examples was based on the use of an SPM tip for “scratching” a surface thereby generating a pattern. This was done initially on bare surfaces and afterward on surfaces modified with organic layers. Although the principle was clearly demonstrated, these techniques suffered from numerous drawbacks including wide variability and the fact that the tip could be easily damaged and/or modified giving rise to unpredictable and uncontrolled variations in the patterns generated. , Avouris and co-workers also demonstrated the ability to use AFM to induce the oxidation of Si wafers, thus generating patterns by the selective etching of the oxide. , The use of electrodeposition with SPM probes for lithographic applications has also been demonstrated This approach offers great resolution and control, and in addition, both the tip and the substrate can be active elements in the process.…”
Section: Introductionmentioning
confidence: 99%