Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes

Abstract

For patterning organic resists, optical and electron beam lithography are the most established methods; however, at resolutions below 30 nanometers, inherent problems result from unwanted exposure of the resist in nearby areas. We present a scanning probe lithography method based on the local desorption of a glassy organic resist by a heatable probe. We demonstrate patterning at a half pitch down to 15 nanometers without proximity corrections and with throughputs approaching those of Gaussian electron beam lithography at similar resolution. These patterns can be transferred to other substrates, and material can be removed in successive steps in order to fabricate complex three-dimensional structures.

Long-range correlated dynamics in ultra-thin molecular glass films

“…These measurements combined with cooling rate-dependent Tg measurements show that the apparent activation barrier for rearrangement decreases sharply in films thinner than 30 nm. These observations suggest long-range facilitation of dynamics induced by the free surface, with dramatic effects on the properties of nano-scale amorphous materials.Nanometer-sized thin films of small organic molecules are widely used in applications ranging from organic photovoltaics[1] and light emitting diodes [2,3], to protective coatings [4] and high resolution nano-imprint lithography [5]. It is advantageous to use amorphous films because, compared to crystals, they do not have grain boundaries to hinder charge transport, generate cracks and defects, or disrupt the writing processes.…”

“…Nanometer-sized thin films of small organic molecules are widely used in applications ranging from organic photovoltaics[1] and light emitting diodes [2,3], to protective coatings [4] and high resolution nano-imprint lithography [5]. It is advantageous to use amorphous films because, compared to crystals, they do not have grain boundaries to hinder charge transport, generate cracks and defects, or disrupt the writing processes.…”

Modular apparatus for electrostatic actuation of common atomic force microscope cantilevers

“…The increase in force available in common mode over a simple tip-bias may be useful for applications such as 3D lithography, where electrostatic forces between a cantilever and a substrate have been used to control cantilever position with exquisite precision. 22 The primary drawbacks to using common mode biasing for DC displacement control are that the actuation force depends strongly on the tip-sample distance and that the sample is immersed in the electric field from the cantilever and tip. Indeed, we find that the electric field from the tip can be a problem for electrostatic actuation on insulating samples, where surface charge redistribution can change the sample's surface potential.…”

Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications

“…The development of rapid and precise nanopatterning methods that are time‐ and cost‐effective is a key to fundamental nanotechnology research, as well as a number of industrial processes. For high‐resolution nanopatterns a number of techniques are well developed, including electron‐/ion‐beam‐based litho­graphy1, 2, 3 and tip‐based lithography,4, 5, 6, 7, 8, 9 but they are often too slow for wafer‐scale processes that demand fast processing times. On the other hand, for large‐area nanopatterning, optical/plasmonic lithography,10, 11, 12, 13, 14, 15 contact printing‐based lithography,16, 17, 18, 19 and template‐assisted lithography20, 21, 22, 23 are promising candidates; however, they require additional expensive and time‐consuming pre‐fabrication processes, such as the preparation of a master template.…”