2021
DOI: 10.1007/s40516-021-00146-2
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Nanosecond Laser Processing for Improving the Surface Characteristics of Silicon Wafers Cut Using Wire Electrical Discharge Machining

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Cited by 2 publications
(4 citation statements)
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“…Finally, the phase shift introduced by the focusing lens (∆t in Equation (A1)) is defined as ∆t = t + r 2 2c(f −z) . In Equation (8) we use somewhat more general initial conditions for generality. These conditions correspond to the dynamics of the Gaussian beam in the paraxial approximation:…”
Section: Disclosuresmentioning
confidence: 99%
See 1 more Smart Citation
“…Finally, the phase shift introduced by the focusing lens (∆t in Equation (A1)) is defined as ∆t = t + r 2 2c(f −z) . In Equation (8) we use somewhat more general initial conditions for generality. These conditions correspond to the dynamics of the Gaussian beam in the paraxial approximation:…”
Section: Disclosuresmentioning
confidence: 99%
“…Fine material processing of semiconductors in general, and silicon in particular is a hot topic both in the scientific community as well as in industry. Up to now a lot of effort has been put into surface processing experiments using mainly nanosecond pulse durations and pulse energies above 1 µJ [1][2][3][4][5][6][7][8]. Processing technology has been well understood both on the practical and theoretical level [7,9].…”
Section: Introduction and State Of The Artmentioning
confidence: 99%
“…Compared to the aforementioned techniques, the laser ablation process is a fast, stable, cost-effective, and reliable method. Moreover, laser is widely used in photovoltaic applications such as texturing, 6 annealing, 7 and thin layer deposition. 8 Laser ablation is commonly performed using pulsed lasers with pulse durations in the range of nanoseconds (ns), picoseconds (ps), and femtoseconds (fs).…”
Section: Introductionmentioning
confidence: 99%
“…Compared to the aforementioned techniques, the laser ablation process is a fast, stable, cost-effective, and reliable method. Moreover, laser is widely used in photovoltaic applications such as texturing, 6 annealing, 7 and thin layer deposition. 8…”
Section: Introductionmentioning
confidence: 99%