Nanosecond UV laser damage and ablation from fluoride crystals polished by different techniques

Reichling, Michael; Sils, J.; Johansen, H.; Matthias, E.

doi:10.1007/s003390051520

Cited by 31 publications

(6 citation statements)

References 2 publications

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“…In the process of irradiation damage, impurity ions reduce the F-H pair formation energy and stabilize the F center and H center. This behavior has been confirmed by various experimental data and calculation results [3,5,11,13] . In order to understand accurately the effect of Y ions on the damage during irradiation, the absorption coefficient was used in this work to assess the damage degree.…”

Section: Irradiation-induced Color Centers Analysissupporting

confidence: 73%

“…Although the transmittance of CaF2 crystal meets the 193 nm lithography requirements, even when the laser energy density is below the damage threshold, they cannot avoid the optical damage caused by cumu-lative ultraviolet radiation. This behavior is known as the incubation effect [1][2][3][4] . To improve the resistance of CaF2 to DUV laser irradiation, investigating the interaction between the DUV laser and CaF2 and clarifying the mechanism of laser damage is very important.…”

mentioning

confidence: 99%

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Irradiation Damage of CaF₂ with Different Yttrium Concentrations under 193 nm Laser

Huajin¹,

Huamin²,

Yongzhe³

et al. 2023

Journal of Inorganic Materials

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The radiation resistance of CaF2 crystal is one of the critical properties in the application of deep ultraviolet lithography, but the damage process of CaF2 crystal under 193 nm laser irradiation is still unclear. This paper reports the damage behavior of CaF2 crystals under 193 nm laser irradiation and the key defect factors affecting the damage. Through the 193 nm laser irradiation experiment, it is found that the crystal damage is mainly manifested as the radiation-induced color centers inside the crystal and the radiation-induced damage pits on the surface. Irradiation-induced color centers were analyzed by UV-visible spectrophotometer, and linear fitting was performed between absorption coefficients of different color centers and Y impurity contents. The results show that the Y ion has a low-order orbit that overlaps with the F center structure wave function, and hybridizes to form a stable structure. Linear fitting results show that there is a linear relationship between Y ions contents and the intrinsic color centers of CaF2 crystals, confirming that Y element is the key impurity ion affecting the formation of color centers. Energy dispersive X-ray spectrometer (EDS) and electron backscatter diffraction (EBSD) were used to characterize the elements distribution and structure defects of radiation-induced damage pits. EDS results show that the content of calcium in the damage pits increases and the content of fluorine decreases, which confirms that the diffusion of H centers and the aggregation of F centers lead to irradiation damage. EBSD results show that surface irradiation damage occurs preferentially at dislocations. Therefore, reducing the impurity content and dislocation density is an important way to improve the anti-irradiation damage performance of calcium fluoride crystals under 193 nm laser.

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Section: Irradiation-induced Color Centers Analysissupporting

confidence: 73%

mentioning

confidence: 99%

Irradiation Damage of CaF₂ with Different Yttrium Concentrations under 193 nm Laser

Huajin¹,

Huamin²,

Yongzhe³

et al. 2023

Journal of Inorganic Materials

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“…As examples, we mention fluoride surfaces gaining tremendous importance for ultraviolet optical components and oxide surfaces that are widely used as supports for catalysts. Surface structure and defects strongly influence optical performance and radiation stability of the former [1], while they determine nucleation, growth and stability of catalytically active particles for the latter [2]. The only direct analytical technique allowing surface analysis of insulators on the atomic scale available to date is scanning force microscopy (SFM) operated in the dynamic mode [3].…”

Section: Introductionmentioning

confidence: 99%

Contrast formation in atomic resolution scanning force microscopy on CaF₂(111): experiment and theory

Barth

Foster

Reichling

et al. 2001

J. Phys.: Condens. Matter

100

113

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We investigate mechanisms of contrast formation in atomic resolution imaging of flat terraces on the CaF 2 (111) surface with scanning force microscopy operated in the dynamic mode. Experimental results are interpreted with a theory based on atomistic modelling. Experiments reveal characteristic contrast features in the form of triangles that can be explained by theory as being due to the interaction of a positively terminated tip with fluorine ions from two different sublattices. Results for a tip with negative termination are found not to be compatible with experiments. We demonstrate that theory correctly predicts the trend in contrast changes when varying the tip-surface distance but is also limited in quantitative agreement due to the non-ideal atomic structure of real tips. In a distance range where such peculiarities do not play a major role, however, we find good quantitative agreement between theoretical predictions and experimental results. The validity of the comparison between theory and experimental scan lines is discussed in detail using an extensive statistical image analysis.

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“…48 In their following work, they used photoacoustic mirage technique to determine the ablation threshold of different optical materials such as CaF2, BaF2, MgF2 and LiF with different polishing techniques. 49 In all the above examples, the laser energy densities were much higher than those used in the present work, resulting in ablation of the substrate itself.…”

Section: Adsorbate Surface Analysismentioning

confidence: 70%

Laser Induced Desorption Time of Flight Mass Spectrometer Analysis of Adsorbed Contaminants on Vacuum Ultraviolet Lithography Optic Materials

Allen¹

2004

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Nanosecond UV laser damage and ablation from fluoride crystals polished by different techniques

Cited by 31 publications

References 2 publications

Irradiation Damage of CaF₂ with Different Yttrium Concentrations under 193 nm Laser

Irradiation Damage of CaF₂ with Different Yttrium Concentrations under 193 nm Laser

Contrast formation in atomic resolution scanning force microscopy on CaF₂(111): experiment and theory

Laser Induced Desorption Time of Flight Mass Spectrometer Analysis of Adsorbed Contaminants on Vacuum Ultraviolet Lithography Optic Materials

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Nanosecond UV laser damage and ablation from fluoride crystals polished by different techniques

Cited by 31 publications

References 2 publications

Irradiation Damage of CaF2 with Different Yttrium Concentrations under 193 nm Laser

Irradiation Damage of CaF2 with Different Yttrium Concentrations under 193 nm Laser

Contrast formation in atomic resolution scanning force microscopy on CaF2(111): experiment and theory

Laser Induced Desorption Time of Flight Mass Spectrometer Analysis of Adsorbed Contaminants on Vacuum Ultraviolet Lithography Optic Materials

Contact Info

Product

Resources

About

Irradiation Damage of CaF₂ with Different Yttrium Concentrations under 193 nm Laser

Irradiation Damage of CaF₂ with Different Yttrium Concentrations under 193 nm Laser

Contrast formation in atomic resolution scanning force microscopy on CaF₂(111): experiment and theory