“…The resistivity of intrinsic ZnO thin films is generally very high, up to~10 5 Ωm [5] and >10 11 Ωm [6] in the directions perpendicular and parallel to the substrate, respectively. Recently, this high resistivity has been applied in fields such as radiation detection [7,8], but to use ZnO in practical photovoltaic applications, the resistivity should be reduced by either creating intrinsic defects, such as oxygen vacancies or metal interstitials, or by introducing extrinsic dopants. ZnO thin films prepared by the former technique may become deoxidized, resulting in a higher resistivity; hence, the latter technique is more desirable for high-temperature applications [6,9].…”