Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials

Abstract

The never-ending race towards miniaturization of devices induced an intense research in the manufacturing processes of the components of those devices. However, the complexity of the process combined with high equipment costs makes the conventional lithographic techniques unfavorable for many researchers. Through years, nanosphere lithography (NSL) attracted growing interest due to its compatibility with wafer-scale processes as well as its potential to manufacture a wide variety of homogeneous one-, two-, or three-dimensional nanostructures. This method combines the advantages of both top-down and bottom-up approaches and is based on a two-step process: (1) the preparation of a colloidal crystal mask (CCM) made of nanospheres and (2) the deposition of the desired material through the mask. The mask is then removed and the layer keeps the ordered patterning of the mask interstices. Many groups have been working to improve the quality of the CCMs. Throughout this review, we compare the major deposition techniques to manufacture the CCMs (focusing on 2D polystyrene nanospheres lattices), with respect to their advantages and drawbacks. In traditional NSL, the pattern is usually limited to triangular structures. However, new strategies have been developed to build up more complex architectures and will also be discussed.

Bottom-Up Assembly and Applications of Photonic Materials

“…Today, nanosphere lithography is a well-known technique used to produce homogeneous and regular arrays of nanoparticles of various sizes [59,60]. In general, nanosphere lithography The use of magnetic self-assembly of paramagnetic colloidal particles is another unique of fabricating colloidal photonic crystals.…”

“…Today, nanosphere lithography is a well-known technique used to produce homogeneous and regular arrays of nanoparticles of various sizes [59,60]. In general, nanosphere lithography involves the preparation of a template consisting of a hexagonal close packed monolayer or bilayer of monodisperse spherical particles onto a substrate surface [45,61].…”

Recent advances in nanoplasmonic biosensors: applications and lab-on-a-chip integration

“…Bottom-up methods based on the chemical synthesis of nanoparticles [21] or colloidal lithography [22,23] fulfill some of these aspects, although top-down approaches [24] are also providing less expensive methods compared to traditional electron beam lithography (EBL) [25] or focus ion beam (FIB) [26,27]. Nanostencil lithography (NSL) based on shadow-masked patterning of the nanostructure [28], nanoimprint lithography that creates nanopatterns by the mechanical deformation of imprint resist [29], and interference lithography where an interference pattern is recorded in a photoresist material [30] are processes that can achieve market significance by offering simple, scalable, and cost-effective fabrication methods and have also the possibility of using flexible substrates.…”

Using nanosphere lithography for fabrication of a multilayered system of ordered gold nanoparticles

“…However, these methods are serial and expensive, which confines high volume manufacture of NP. An alternative method for production of ordered NP with determined shape is the nanosphere lithography (NSL) [1][2][3]. NSL is a powerful process to produce various arrays of periodic structures that may be used in the field of nano-and microfabrication.…”