Nanostripe patterning of glass surface by nanoimprint using self-organized oxide mold

Self-organized near-field etching of the sidewalls of glass corrugations

“…The nano-stripe pattern was fabricated on of a soda-lime glass specimen, using a thermal nanoimprint technique with NiO molds [9]. The NiO mold patterns were transferred to the soda-lime glass at 600°C for 5 minutes under 10 MPa of pressure.…”

Sub-nanoscale nanoimprint fabrication of atomically stepped glassy substrates of silicate glass and acryl polymer

“…So far, novel feature sizes as small as 2 nm have been obtained on the surface of a poly(acrylic acid) (PAA) polymer by imprinting with a single-walled carbon nanotube mold [12]. Recently, we successfully performed sub-nanometer-scale surface patterning on sodalime silicate glasses as well as acryl polymers by the thermal nanoimprint technique [13][14][15][16][17][18], in which self-organized nanopattern molds of atomically stepped sapphire (a-Al 2 O 3 single crystal) substrates were applied as the imprint template [19]. These nanostructured sapphire molds exhibit the unique surface morphology having about 0.2-nm-high straight steps and about 100-nm-wide ultrasmooth terraces [19,20].…”

“…The atomic-step height on the sapphire wafers was found to depend on the crystallographic plane of the outermost surface. For the (0001) c-plane, (11)(12)(13)(14)(15)(16)(17)(18)(19)(20) a-plane, and (10-12) r-plane sapphire substrates, each atomic step was reported to be 0.21, 0.24, and 0.34 nm, respectively [20].…”

“…1 was pressed onto the surface of the soda-lime silicate glass substrate. The sample was heated at 580-620°C, pressed at 2-4 MPa for Figure 3 shows an AFM surface image of the glass substrate imprinted under the pressing conditions of 610°C, 3 MPa, and 300 s [15,16]. A regularly stepped morphology on the surface is observed.…”

Atomic step patterning in nanoimprint lithography: Molecular dynamics study

“…11 With regard to the vertical resolution, Akita et al produced 0.2-0.3-nm stepped glass surfaces. [12][13][14] However, experimental evaluation of the ultimate resolution in NIL is difficult because of the observation limit of the measurement system.…”