Nanostructure fabrication on silicon surfaces by atom transfer from a gold tip using an ultrahigh vacuum scanning tunneling microscope

Fujita, Daisuke; Jiang, Qiwen; Dong, Zhen‐Chao; Sheng, Hanyu; Nejoh, H.

doi:10.1088/0957-4484/8/3a/003

Cited by 11 publications

(4 citation statements)

References 20 publications

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“…Another method of surface modification is the direct transfer of material from the probe to the surface [31][32][33][34][35][36][37] . The distinctive feature of these experiments is that the voltage is applied in short pulses, the distance between the probe and the surface is very small, typically less than 1-2 nm.…”

Section: Experiments and Discussionmentioning

confidence: 99%

Fabrication of sharp atomic force microscope probes using in situ local electric field induced deposition under ambient conditions

Temiryazev

Bozhko

Robinson³

et al. 2016

Review of Scientific Instruments

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We demonstrate a simple method to significantly improve the sharpness of standard silicon probes for an atomic force microscope or to repair a damaged probe. The method is based on creating and maintaining a strong, spatially localized electric field in the air gap between the probe tip and the surface of conductive sample. Under these conditions, nanostructure growth takes place on both the sample and the tip. The most likely mechanism is the decomposition of atmospheric adsorbate with subsequent deposition of carbon structures. This makes it possible to grow a spike of a few hundred nanometers in length on the tip. We further demonstrate that probes obtained by this method can be used for high-resolution scanning. It is important to note that all process operations are carried out in situ, in air and do not require the use of closed chambers or any additional equipment beyond the atomic force microscope itself.

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Section: Experiments and Discussionmentioning

confidence: 99%

Fabrication of sharp atomic force microscope probes using in situ local electric field induced deposition under ambient conditions

Temiryazev

Bozhko

Robinson³

et al. 2016

Review of Scientific Instruments

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“…The threshold voltage for gold atom transfer is approximately ∼5 V. The corresponding electric field of ∼ 5 V nm −1 is significantly lower than the reported threshold value for the field evaporation of Au − (∼17 V nm −1 ) [30]. Although the deposition of gold nanodots on clean Si surfaces in UHV was successfully demonstrated by applying voltage pulses and has been extensively studied [24,29], the formation of continuous nanowires was found to be difficult due to the low deposition probability of gold (∼60%) [23].…”

Section: Nanostructure Fabrication By Tip-materials Transfer Using Volmentioning

confidence: 90%

“…One of the most intensively investigated STM-based nanofabrication techniques is the electric-field-induced material transfer of a tip to a substrate through the application of voltage pulses [16][17][18][19][20][21][22][23][24][25][26][27][28][29]. Because the pulse width applied is less than ∼1 ms, this method is fast.…”

Section: Nanostructure Fabrication By Tip-materials Transfer Using Volmentioning

confidence: 99%

Active nanocharacterization of nanofunctional materials by scanning tunneling microscopy

Fujita

Sagisaka

2008

Science and Technology of Advanced Materials

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Recent developments in the application of scanning tunneling microscopy (STM) to nanofabrication and nanocharacterization are reviewed. The main focus of this paper is to outline techniques for depositing and manipulating nanometer-scale structures using STM tips. Firstly, the transfer of STM tip material through the application of voltage pulses is introduced. The highly reproducible fabrication of metallic silver nanodots and nanowires is discussed. The mechanism is thought to be spontaneous point-contact formation caused by field-enhanced diffusion to the apex of the tip. Transfer through the application of z-direction pulses is also introduced. Sub-nanometer displacement pulses along the z-direction form point contacts that can be used for reproducible nanodot deposition. Next, the discovery of the STM structural manipulation of surface phases is discussed. It has been demonstrated that superstructures on Si(001) surfaces can be reverse-manipulated by controlling the injected carriers. Finally, the fabrication of an atomic-scale one-dimensional quantum confinement system by single-atom deposition using a controlled point contact is presented. Because of its combined nanofabrication and nanocharacterization capabilities, STM is a powerful tool for exploring the nanotechnology and nanoscience fields.

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“…14 Since Mamin et al 12. first reported the fabrication of gold mounds by field‐emission lithography with an ultrahigh‐vacuum scanning tunneling microscope (UHV‐STM) and a gold probe, various other metallic nanostructures have been patterned, including gold on silicon surfaces,15, 16 copper on gold17 and silicon surfaces,16 and platinum on silicon surfaces 18. More recently, to directly deposit gold onto silicon surfaces, field‐emission lithography has been carried out with atomic force microscopy (AFM) in contact mode under UHV conditions19 and in noncontact mode in air 20.…”

mentioning

confidence: 99%

Fabrication of Gold Nanowires by Electric‐Field‐Induced Scanning Probe Lithography and In Situ Chemical Development

Lee

Chen

Chilkoti

et al. 2007

Small

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Sowing seeds to grow wires: A new approach for the fabrication of surface‐confined gold nanostructures for electronic and plasmonic applications is described. Clusters of gold atoms (seeds) are deposited during nanostructure patterning by electric‐field‐induced scanning probe lithography (seeimage); these seeds are subsequently developed in situ. This simple approach can be extended to other metals, and is promising for massively parallel implementation through anodization stamping.

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Nanostructure fabrication on silicon surfaces by atom transfer from a gold tip using an ultrahigh vacuum scanning tunneling microscope

Cited by 11 publications

References 20 publications

Fabrication of sharp atomic force microscope probes using in situ local electric field induced deposition under ambient conditions

Fabrication of sharp atomic force microscope probes using in situ local electric field induced deposition under ambient conditions

Active nanocharacterization of nanofunctional materials by scanning tunneling microscopy

Fabrication of Gold Nanowires by Electric‐Field‐Induced Scanning Probe Lithography and In Situ Chemical Development

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