2013
DOI: 10.1016/j.vacuum.2012.03.039
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Nanostructure formation of Cu/Si(100) thin film induced by ion beam bombardment

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Cited by 3 publications
(2 citation statements)
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“…modified by plasma have many applications in the field of automobiles, printed circuit board manufacturing, and electromagnetic interference shielding materials [12]. Metal surface modification by plasma on polycrystalline Cu has created a lot of interest to form ordered nanostructures [13][14][15]. The nanostructure formation by plasma treatment has been investigated intensively [16], but the majority of studies focused on patterning the surfaces of bulk materials and few studies have been reported on thin metal films [13,15].…”
Section: Introductionmentioning
confidence: 99%
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“…modified by plasma have many applications in the field of automobiles, printed circuit board manufacturing, and electromagnetic interference shielding materials [12]. Metal surface modification by plasma on polycrystalline Cu has created a lot of interest to form ordered nanostructures [13][14][15]. The nanostructure formation by plasma treatment has been investigated intensively [16], but the majority of studies focused on patterning the surfaces of bulk materials and few studies have been reported on thin metal films [13,15].…”
Section: Introductionmentioning
confidence: 99%
“…Metal surface modification by plasma on polycrystalline Cu has created a lot of interest to form ordered nanostructures [13][14][15]. The nanostructure formation by plasma treatment has been investigated intensively [16], but the majority of studies focused on patterning the surfaces of bulk materials and few studies have been reported on thin metal films [13,15]. The microstructure such as the distribution of grains and grain orientation in polycrystalline thin films generally affects the properties, performance, and reliability of thin films [17].…”
Section: Introductionmentioning
confidence: 99%