Nanostructure technology

Chang, T. H. P.; Kern, D. P.; Kratschmer, E.; Lee, K. Y.; Luhn, H.E.; McCord, Mark A.; Rishton, S. A.; Vladimirsky, Yuli

doi:10.1147/rd.324.0462

Cited by 53 publications

(17 citation statements)

References 130 publications

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“…The resolution of e-beam lithography depends on the beam size and several factors related to the electron-solid interaction [24,25]. In a resist, electrons undergo small angle forward scattering and some back-scattering events coming from the substrate.…”

Section: Electron Beam Lithographymentioning

confidence: 99%

Nanofabrication: Conventional and nonconventional methods

2001

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Nanofabrication is playing an ever increasing role in science and technology on the nanometer scale and will soon allow us to build systems of the same complexity as found in nature. Conventional methods that emerged from microelectronics are now used for the fabrication of structures for integrated circuits, microelectro-mechanical systems, microoptics and microanalytical devices. Nonconventional or alternative approaches have changed the way we pattern very fine structures and have brought about a new appreciation of simple and low-cost techniques. We present an overview of some of these methods, paying particular attention to those which enable large-scale production of lithographic patterns. We preface the review with a brief primer on lithography and pattern transfer concepts. After reviewing the various patterning techniques, we discuss some recent application issues in the fields of microelectronics, optoelectronics, magnetism as well as in biology and biochemistry.

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Section: Electron Beam Lithographymentioning

confidence: 99%

Nanofabrication: Conventional and nonconventional methods

2001

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“…Acting in combination, these trends place severe requirements on the mask-writing tool [5]. The high-resolution capability of e-beam writers has been used to advantage throughout the early development of X-ray mask technology with the vector scan generation of tools at the IBM Thomas J. Watson Research Center [6]. Using this capability, a robust process was developed by which X-ray masks could be patterned with high fidelity.…”

Section: Figurementioning

confidence: 99%

Electron beam lithography tool for manufacture of X-ray masks

Groves¹,

Hartley²,

Pfeiffer³

et al. 1993

IBM J. Res. & Dev.

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“…Both of these factors contribute to an improvement in resolution. However, accurate pattern element deinition in resist, especially at high pattern density, is also limited by the well-known proximity effect [5][6][7]; i.e., adjacent areas not directly exposed to the incident e-beam receive partial exposure from backscattered electrons. The proximity effect is particularly severe for dense patterns with dimensions and spacings of 1 ^m or less.…”

Section: Electron-beam Tool and Process Characteristicsmentioning

confidence: 99%