Nanostructured thin films–background, preparation and relation to the technological revolution of the 21st century

Benelmekki, Maria; Erbe, Andreas

doi:10.1016/b978-0-08-102572-7.00001-5

Cited by 35 publications

(16 citation statements)

References 81 publications

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“…The signature of these stages driven by their underlying oxidation mechanisms could be traced in the LSPR response of the particles. These insights on competing oxidation mechanisms of metallic nanoparticles are valuable for nanosensors 58 , nanoelectronics 59 and catalysis 60,61 . More generally, our in situ detection scheme provides opportunities to investigate the intricate details of chemical reactions involving nanoparticles in gaseous environments, and the resulting changes in their optical response.…”

Section: Discussionmentioning

confidence: 99%

Unravelling Competing Oxidation Mechanisms in Single Cu Nanoparticles

Nilsson

Nielsen

Fritzsche

et al. 2022

Preprint

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Metals are prone to oxidation, which often results in significant changes to optical, electronic, chemical and mechanical properties in bulk systems. Nanoparticles are no exception in this respect but a holistic understanding of the mechanisms governing their oxidation is lacking. Here, we capture in situ the oxidation of single Cu nanoparticles to unravel a sequential competitive activation of different oxidation mechanisms at temperatures between 50 and 200°C. Using environmental scanning transmission electron microscopy, we reveal the morphological evolution of oxide formation in detail and identify the formation of multiple oxide layers separated by a vacancy gap. Moreover, using in situ electron energy-loss spectroscopy, we map the plasmonic response of individual particles induced by oxidation, and reveal generic geometrical pathways for nanoscale Kirkendall void nucleation and growth that are driven by surface energy minimization. Based on these insights, we uncover the mechanistic pathway of Cu nanoparticle oxidation.

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Section: Discussionmentioning

confidence: 99%

Unravelling Competing Oxidation Mechanisms in Single Cu Nanoparticles

Nilsson

Nielsen

Fritzsche

et al. 2022

Preprint

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“…Mechanical and thermal properties and phase stability such as melting point and thermal conductivity of a coating material should be considered when choosing appropriate process parameters (Madhuri, 2020) FIGURE 2.8 Schematic diagram of a plasma CVD (chemical vapor deposition) system ( Public domain). Benelmekki and Erbe (2019) point out that CVD processes are well known and developed and reactors used for the process variations depend basically on the type of precursors, deposition conditions, and forms of energy introduced to the system to activate the desired chemical reaction. Apart from the previously mentioned modifications, the authors consider two more processes as the most established ones:…”

Section: Processes Of Hard Alloys Coatingsmentioning

confidence: 99%

“…• Metal-organic CVD process which is applied when metal-organics are used as precursors, such as trimethylaluminum, Al 2 (CH 3 ) 6 , or trimethylgallium, Ga(CH 3 ) 3 • Aerosol-assisted CVD where liquid precursors are introduced to the CVD reactor in an aerosol form, facilitating its evaporation (Benelmekki and Erbe, 2019) Physical vapor deposition (PVD) is a vacuum process where material is transferred in the form of vapor particles from a material source to the substrate surface where it is condensed as a film (Bouzakis and Michailidis, 2018). PVD encompasses a broad family of vacuum coating processes employing material removal from a source by evaporation or sputtering.…”

Section: Processes Of Hard Alloys Coatingsmentioning

confidence: 99%

Remanufacturing and Advanced Machining Processes for New Materials and Components

Gevorkyan¹,

Rucki²,

Nerubatskyi³

et al. 2022

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Reasonable efforts have been made to publish reliable data and information, but the author and publisher cannot assume responsibility for the validity of all materials or the consequences of their use. The authors and publishers have attempted to trace the copyright holders of all material reproduced in this publication and apologize to copyright holders if permission to publish in this form has not been obtained. If any copyright material has not been acknowledged please write and let us know so we may rectify in any future reprint.The Open Access version of this book, available at www.taylorfrancis.com, has been made available under a Creative Commons Attribution-Non Commercial-No Derivatives 4.0 license.

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“…Usualmente se utiliza un baño ultrasónico, que genera ultrasonido que se propaga por todo el precursor para agitar sus partículas, hasta la aparición de unas gotitas de aerosol. El gas acarreador transporta al aerosol por el sistema para que reaccione y se deposite en el sustrato (Benelmekki & Erbe, 2019).…”

Section: Deposición Química De Vapor a Baja Presión (Lpcvd)unclassified

Síntesis de nanoestructuras de carbono mediante la Técnica de Deposición Química de Vapores: Una revisión general

et al. 2021

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Es innegable el auge que ha tenido la nanotecnología en las últimas tres décadas. Responsables de este interés en los nanomateriales son principalmente las formas nanoestructuradas del carbono, ya que históricamente fueron las que inauguraron el estudio de los nanomateriales con el descubrimiento de los fullerenos en 1985 y los nanotubos de carbono en 1991. Aunque existen diversas técnicas para producir estos materiales, la deposición química de vapores (CVD, por sus siglas en inglés) es particularmente valiosa, ya que permite la producción de una gran variedad de nanoestructuras de carbono, es versátil, escalable, de fácil implementación y de relativamente bajo costo. En este artículo de revisión se destaca la importancia de CVD y se detallan sus principios, condiciones y parámetros de operación, así como sus principales variantes. Se realiza una descripción de la técnica utilizada para producir fullerenos, nano-cebollas, nanotubos de carbono, nanoesferas, grafeno y otras, recalcando los parámetros específicos para cada síntesis.

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Nanostructured thin films–background, preparation and relation to the technological revolution of the 21st century

Cited by 35 publications

References 81 publications

Unravelling Competing Oxidation Mechanisms in Single Cu Nanoparticles

Unravelling Competing Oxidation Mechanisms in Single Cu Nanoparticles

Remanufacturing and Advanced Machining Processes for New Materials and Components

Síntesis de nanoestructuras de carbono mediante la Técnica de Deposición Química de Vapores: Una revisión general

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