Nanotopographical control of surfaces using chemical vapor deposition processes

Koenig, Meike; Lahann, Joerg

doi:10.3762/bjnano.8.126

Cited by 7 publications

(7 citation statements)

References 45 publications

(50 reference statements)

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“…56 Capable of forming robust and stable coatings on almost any substrate material, 8 CVD presents a versatile route to chemically reactive surfaces. 57 In the past, soft elastomeric stamps such as PDMS were used to transfer chemical patterns onto reactive CVD-based coatings via click reactions. 58,59 Subsequently, these patterns could be amplified into cellular and biomolecular patterns.…”

Section: Introductionmentioning

confidence: 99%

“…Chemical vapor deposition (CVD) polymerization is a substrate-independent surface-modification tool that yields reactive coatings in a solvent-free, pinhole-free, and conformal manner . Capable of forming robust and stable coatings on almost any substrate material, CVD presents a versatile route to chemically reactive surfaces . In the past, soft elastomeric stamps such as PDMS were used to transfer chemical patterns onto reactive CVD-based coatings via click reactions. , Subsequently, these patterns could be amplified into cellular and biomolecular patterns.…”

Section: Introductionmentioning

confidence: 99%

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Substrate-Independent Micropatterning of Polymer Brushes Based on Photolytic Deactivation of Chemical Vapor Deposition Based Surface-Initiated Atom-Transfer Radical Polymerization Initiator Films

Kumar

Welle²,

Becker³

et al. 2018

ACS Appl. Mater. Interfaces

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Precise microscale arrangement of biomolecules and cells is essential for tissue engineering, microarray development, diagnostic sensors, and fundamental research in the biosciences. Biofunctional polymer brushes have attracted broad interest in these applications. However, patterning approaches to creating microstructured biointerfaces based on polymer brushes often involve tedious, expensive, and complicated procedures that are specifically designed for model substrates. We report a substrate-independent, facile, and scalable technique with which to prepare micropatterned biofunctional brushes with the ability to generate binary chemical patterns. Employing chemical vapor deposition (CVD) polymerization, a functionalized polymer coating decorated with 2-bromoisobutyryl groups that act as atom-transfer radical polymerization (ATRP) initiators was prepared and subsequently modified using UV light. The exposure of 2-bromoisobutyryl groups to UV light with wavelengths between 187 and 254 nm resulted in selective debromination, effectively eliminating the initiation of ATRP. In addition, when coatings incorporating both 2-bromoisobutyryl and primary amine groups were irradiated with UV light, the amines retained their functionality after UV treatment and could be conjugated to activated esters, facilitating binary chemical patterns. In contrast, polymer brushes were selectively grown from areas protected from UV treatment, as confirmed by atomic force microscopy, time-of-flight secondary ion mass spectrometry, and imaging ellipsometry. Furthermore, spatial control over biomolecular adhesion was achieved in three ways: (1) patterned nonfouling brushes resulted in nonspecific protein adsorption to areas not covered with polymer brushes; (2) patterned brushes decorated with active binding sides gave rise to specific protein immobilization on areas presenting polymer brushes; (3) and primary amines were co-patterned along with clickable polymer brushes bearing pendant alkyne groups, leading to bifunctional reactivity. Because this novel technique is independent of the original substrate's physicochemical properties, it can be extended to technologically relevant substrates such as polystyrene, polydimethylsiloxane, polyvinyl chloride, and steel. With further work, the photolytic deactivation of CVD-based initiator coatings promises to advance the utility of patterned biofunctional polymer brushes across a spectrum of biomedical applications.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Substrate-Independent Micropatterning of Polymer Brushes Based on Photolytic Deactivation of Chemical Vapor Deposition Based Surface-Initiated Atom-Transfer Radical Polymerization Initiator Films

Kumar

Welle²,

Becker³

et al. 2018

ACS Appl. Mater. Interfaces

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“…OTS Polymeric C [370][371][372][373][374][375][376][377][378] Si/SiO 2 , MUO OTS, ODPA, Cu, Ru, Fe, Pt Si:H 275 Si SiO 2 pc-Si 379, 380 Si, SiO-OH SiO 2 4 sec (@ 85°C) PECVD SiO x (x = 1-2) [640][641][642][643][644] W, Pt/Cu Unipolar 5, 1 100 -10 4 >60 >10 4 sec (@ 100°C) PECVD SiO x (x = 1-2) [640][641][642][643][644] W, Pt/Cu Bipolar 1, −2 100 -10 4 >60 >10 4 sec (@ 100°C) Spin-on SiOCH [645][646][647] W, Pt/Cu, Ag Bipolar 0.7, −0.15 >10 4 500-2000 >10 3 sec (@ 85°C) PECVD SiOCH 635 W, Pt/Cu, Ag Bipolar LPCVD SiN x :H (x ∼ = 1.3) [649][650][651] Si/Ni, Au Bipolar 4, −2 10-10 5 50-100 >10 4 sec (@ 100°C) PECVD SiN x :H (x = 0.6-1.2) [651][652][653][654][655] W, Al, Pt/Ag, Ti, Ni Bipolar 1-2, −1-−2 70-10 3 >10 3 >10 5 sec (@ 85°C) SiC x :H (x ∼ = 1) [659][660][661][662][663][664] Pt, Au, W/Cu, Ag Bipolar 1-2, −1-−2 100-10 8 >10 4 >10 4 sec (@ 85°C) Polymer (x = 1 -> 3) [665][666][667...…”

Section: Siochmentioning

confidence: 99%

Review—Beyond the Highs and Lows: A Perspective on the Future of Dielectrics Research for Nanoelectronic Devices

Jenkins

Austin

Conley

et al. 2019

ECS J. Solid State Sci. Technol.

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High-dielectric constant (high-k) gate oxides and low-dielectric constant (low-k) interlayer dielectrics (ILD) have dominated the nanoelectronic materials research scene over the past two decades, but they have recently reached a state of maturity and perhaps the limits of their scaling. Based on this, there is a need for a systematic review summarizing not only the historic research and achievements on high-k and low-k dielectrics, but also emerging device applications as well as an outlook of future challenges. We begin by first reviewing the factors that drove the emergence of low-k and high-k materials in nanoelectronics as ILD and gate dielectric materials, respectively, and the challenges and limits these materials ultimately approached in terms of permittivity scaling. We then illustrate that gate dielectric and ILD applications represent just a small fraction of the numerous dielectrics utilized in present day nanoelectronic products where permittivity scaling is now being increasingly demanded for materials such as dielectric spacers, trench isolation, and etch stopping layers. We conclude by examining the numerous new applications for dielectric materials that are emerging as the semiconductor industry transitions to novel patterning schemes, prepares for life post CMOS scaling, and explores ways to natively embed device functionality in the metal interconnect. For the former, we specifically examine the “colorful” requirements for the various enabling dielectric hardmask and spacer materials utilized in pitch division-multi-pattern processes and then discuss the role that selective area deposition of dielectrics and metals could play in reducing the complexity of such patterning processes. For the latter, we review the use of both high-k and low-k dielectrics in various metal-insulator-metal (MIM) structures as Fermi level de-pinning layers, tunnel diodes, and back-end-of-line (BEOL) compatible capacitive and resistive switching random access memory (ReRAM) elements. We further examine how dielectrics can hinder or aid new forms of computing such as quantum and neuromorphic in reaching their full potential. In conclusion, we find that while the field of dielectrics has a long history, it remains vibrant with numerous exciting new and old research vectors awaiting further exploration.

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“…55,56 When targeted toward bacteria, vapor-deposition techniques offer unique nanoscale control of patterned/gradient designs and topographical features, mechanical properties, and surface energy that can be leveraged to interface with the sensory apparatuses of bacteria. 57,58 Vapor-deposited inorganic biointerfaces are most commonly utilized for antimicrobial applications, because inorganic materials can damage bacterial membranes or generate toxic reactive species (see Section 2.1 for details). Vapor deposition of organic biointerfaces further enables the tuning of a wide range of surface features, including surface energy, topography, stimuli-responsiveness, and incorporation of bioactive molecules (such as enzymes and peptides).…”

Section: T H Imentioning

confidence: 99%

Vapor-Deposited Biointerfaces and Bacteria: An Evolving Conversation

Donadt

Yang

2019

ACS Biomater. Sci. Eng.

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At the biointerface where materials and microorganisms meet, the organic and synthetic worlds merge into a new science that directs the design and safe use of synthetic materials for biological applications. Vapor deposition techniques provide an effective way to control the material properties of these biointerfaces with molecular-level precision that is important for biomaterials to interface with bacteria. In recent years, biointerface research that focuses on bacteria–surface interactions has been primarily driven by the goals of killing bacteria (antimicrobial) and fouling prevention (antifouling). Nevertheless, vapor deposition techniques have the potential to create biointerfaces with features that can manipulate and dictate the behavior of bacteria rather than killing or deterring them. In this review, we focus on recent advances in antimicrobial and antifouling biointerfaces produced through vapor deposition and provide an outlook on opportunities to capitalize on the features of these techniques to find unexplored connections between surface features and microbial behavior.

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Nanotopographical control of surfaces using chemical vapor deposition processes

Cited by 7 publications

References 45 publications

Substrate-Independent Micropatterning of Polymer Brushes Based on Photolytic Deactivation of Chemical Vapor Deposition Based Surface-Initiated Atom-Transfer Radical Polymerization Initiator Films

Substrate-Independent Micropatterning of Polymer Brushes Based on Photolytic Deactivation of Chemical Vapor Deposition Based Surface-Initiated Atom-Transfer Radical Polymerization Initiator Films

Review—Beyond the Highs and Lows: A Perspective on the Future of Dielectrics Research for Nanoelectronic Devices

Vapor-Deposited Biointerfaces and Bacteria: An Evolving Conversation

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