Electrical properties of point defects in 4H-SiC have been studied extensively, but those related to carbon interstitials (C i ) have remained elusive until now. Indeed, when introduced via ion irradiation or implantation, signatures related to C i observed by deep level transient spectroscopy (DLTS) tend to overlap with those of other primary defects, making the direct identification of C i -related levels difficult. Recent literature has suggested to assign the so-called M center, often found in as-irradiated 4H-SiC, to charge state transitions of the C i defect in different configurations. In this work, we have introduced excess carbon into low-doped ntype 150 µm thick 4H-SiC epilayers by thermal annealing, with a pyrolyzed carbon cap on the sample surface acting as a carbon source. Because the layers exhibited initially low concentrations of carbon vacancies ([V C ] = 10 11 cm −3 ), this enabled us to study the case of complete V C annihilation, and formation of defects due to excess carbon, i.e. carbon interstitials C i and their higher-order complexes. We report on the occurrence of several new levels upon C injection which are likely C i -related. Their properties are different from those found for the M center, which points towards a different microscopic identity of the detected levels. This suggests the existence of a rich variety of C i -related defects. The study will also help generating new insights into the microscopic process of V C annihilation during carbon injection processes.