Epitaxial Pb(Mg1/3Nb2/3)O3-PbTiO3 (PMN-PT) thin films were fabricated on (La,Sr)CoO3/CeO2/
YSZ coated Si substrates by double-pulse excitation PLD with and without a mask. For
double-pulse excitation PLD without a mask in conditions of Nd:YAG laser irradiation before
defocused KrF-excimer-laser irradiation, the surface roughness of PMN-PT thin films was rather
less than that of the films fabricated using Nd:YAG single laser PLD. Thin films with smoother
surfaces were deposited at the high deposition rate of 5.6 nm·min-1 using the mask and the
double-pulse excitation PLD method in conditions of irradiation of Nd:YAG laser after KrF
excimer laser at 0.5 =s delays.