The incorporation of prascodymiiim (Pr) into GaAs, Ino,s:,Ga,,.d.rAs, and InP during liquid-phase epitaxy were investigated by double crystal x-ray diffraction, Hall effect, low tcmperature photoluniiricscerice (PL) measnrements. The lattice mismatch slightly vary with Pr concentration in the growth mclts. Examinations of the electrical property illustrate that the lower carriers conccntrations and a higher mobilities are obtain from Pr-doped epilayers than undopcd sample (In~,.~:~Gq~.~i.As and InP). The PL spcctra (15-K) show that thc intensity of the impurity related peaks decreases and the mar-hand-to-hand luminescence intensity increase. They also reveal that the irnpuritics are gettered by Pr ions during LPE growth. Thus, for the purpose of purification, propcr amonrit of Pr in the growth melts is suggested. No intra-4f-shell transition line is observed from the Pr-doped GaAs, In,).s:{Ga,,,47As, and InP layers.