Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings

Li, Yuanfang; Chen, Huoyao; Kroker, Stefanie; Käsebier, Thomas; Liu, Zhengkun; Qiu, Keqiang; Liu, Ying; Kley, Ernst‐Bernhard; Xu, Xiangdong; Ye, Hong; Fu, Shaojun

doi:10.3788/col201614.090501

Cited by 5 publications

(2 citation statements)

References 9 publications

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“…The photoresist pattern features was successfully transfered by the use of a phase mask interference lithography, and this method greatly simplifies the lithography optical device compared to conventional interference lithography, while also enabling replication in large quantities. In the experimental results, there are some imperfections.First, multiple airdielectric layer interfaces will generate multiple reflection oscillations to modulate the fringes [6] . Second, the modulated light field generated by stray light and mounting errors will also interfere with the fringes at the local area, which are mainly characterized by the diffraction wavefront.…”

Section: Discussionmentioning

confidence: 99%

“…The design of the phase mask emphasizes the intensity distribution of the diffracted beams, moreover a relatively equal intensity distribution is related to the subsequent practical reproduction process.In general,we consider the intensity contrast η of 0.85 or more created by two diffracted beam as a reference standard 6,7] . We use a finite element calculation method to optimize the basic parameters of the phase mask with a line density of 3000, such as duty of cycle and groove depth, in which Figures 3 (a) and (b) represent the diffraction efficiencies of zero-order and negative first-order, while the two red line intervals are the operating parameter ranges.…”

Section: Design and Optimization Of Phase Masksmentioning

confidence: 99%

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Interference lithography based on a phase mask for the fabrication of diffraction gratings

Huan,

Sun,

et al. 2023

AOPC 2023: Optical Design and Manufacturing

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Section: Discussionmentioning

confidence: 99%

Section: Design and Optimization Of Phase Masksmentioning

confidence: 99%

Interference lithography based on a phase mask for the fabrication of diffraction gratings

Huan,

Sun,

et al. 2023

AOPC 2023: Optical Design and Manufacturing

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Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

et al. 2019

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A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written phase mask with an area of 52 mm × 30 mm and a central line density greater than 3000 lines mm−1 was used. The introduction of the EBL-written phase mask substantially simplified the NFH optics for pattern transfer. The characterization of the groove density distribution and diffraction efficiency of the fabricated VLSGs indicates that the EBL–NFH method is feasible and promising for achieving high-accuracy groove density distributions with corresponding image properties. Vertical stray light is suppressed in the soft X-ray spectral range.

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Fabrication of double-grooved gratings using coplanar multibeam holographic lithography with a phase mask

Li,

Huan,

Ren

et al. 2024

Journal of Vacuum Science &Amp; Technology B

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Submicrometer double-grooved gratings feature unique optical properties and diverse potential applications, most of which have been fabricated by electron beam lithography up till now. On the other hand, holographic lithography based on a phase mask [near-field holography (NFH)] has the advantages of high throughput, low cost, and a compact setup in terms of a short optical path. Distinguished from conventional NFH based on double-beam interference, multibeam NFH based on multibeam interference is studied to form groove profiles of double-grooved gratings in this study. The formation principle of double-grooved gratings is attributed to the multibeam interference of the transmitted beams behind the phase mask. Within such multibeam interference, every two of diffracted beams interfere and form several sets of latent subgrating patterns. The formation of double-grooved gratings can be understood as the superimposition of different portions of subgrating patterns. We also demonstrated the potential and challenges of several key factors in tailoring the symmetric and asymmetric double-grooved structures, including the incidence angles, the efficiency distribution of phase masks, exposure-development conditions, and the spacing between the mask and substrate. Symmetric and asymmetric double-grooved gratings with periods of 666.7, 950, and 1000 nm were fabricated by coplanar three-beam NFH at normal incidence, and coplanar four-beam NFH at oblique incidence and near normal incidence. The experimental results of the evolution of the grating profiles of double-grooved gratings are in relatively good agreement with the simulation. This study provides an alternative cost-effective fabrication method for the mass production of double-grooved gratings. Moreover, this study also enriches the diversity of groove profiles of diffraction grating by NFH.

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Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings

Cited by 5 publications

References 9 publications

Interference lithography based on a phase mask for the fabrication of diffraction gratings

Interference lithography based on a phase mask for the fabrication of diffraction gratings

Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask

Fabrication of double-grooved gratings using coplanar multibeam holographic lithography with a phase mask

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