Near-field optical lithography method for fabrication of the nanodimensional objects

Dryakhlushin, V.F.; Klimov, A. Yu.; Rogov, Vladimir V.; Vostokov, N. V.

doi:10.1016/j.apsusc.2005.03.081

Cited by 24 publications

(14 citation statements)

References 8 publications

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“…The scanning microscope probe, which is coated with a metal to prevent leakage of the electric field laterally through cone section of the probe, was employed as the scanning probe to expose the photoresist beneath the probe tip [84][85][86]. Some experiments demonstrated that metal thin film under the probe can also be etched utilizing the photothermal effect [87][88][89]. The photo-thermal effect occurs owing to absorption of the light with high-energy density [90].…”

Section: Plasmonic Direct Writing Nanolithographymentioning

confidence: 99%

Plasmonic Nanolithography: A Review

Xie

Wang

et al. 2011

Plasmonics

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Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.

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Section: Plasmonic Direct Writing Nanolithographymentioning

confidence: 99%

Plasmonic Nanolithography: A Review

Xie

Wang

et al. 2011

Plasmonics

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“…These photonic structures patterned in thin photoresist layer can be employed as a mask for patterning of III-V semiconductor surfaces, what may be attractive for photonic applications in optoelectronic as waveguides [17][18][19] , lasers 20, 21 and light emitting diodes 22-25 . However, due to the diffraction limit, it is very difficult for the interference lithography to reach the subwavelength resolution. The subwavelength resolution can be provided by submicron-diameter optical fiber, where the metal coated fiber tip is used as a subwavelength fiber probe for a local exposure [14][15][16] . A combination of such fiber probe with a nanoposition system can be used as the near-field scanning optical microscope lithography (NSOM) with high exposure resolution.…”

Section: Introductionmentioning

confidence: 99%

“…PhC structures for integrated optics and optoelectronics can be fabricated by different lithography techniques as interference lithography [1][2][3][4][5][6] , ion and electron beam lithography 7,8 , nanoimprint lithography [9][10][11] , and near-field scanning optical microscope lithography [12][13][14][15][16] . Optical techniques presented in this paper allow maskless definition of planar microstructures.…”

Section: Introductionmentioning

confidence: 99%

Advanced optical methods for patterning of photonic structures in photoresist, III-V semiconductors and PMMA

Pudiš

Suslik

Kubicova

et al. 2010

17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics

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This contribution presents experimental results in the field of planar two-dimensional (2D) photonic crystal (PhC) structures, as well as their design, fabrication and analysis. We demonstrate maskless optical methods leading to fabrication of 2D PhC structures for applications in optoelectronics. The 2D PhC structures of square and triangular symmetries with period from 275 nm to 2 μm were fabricated in thin photoresist layer, III-V semiconductor surfaces and polymethylmethacrylate using interference lithography and near-field scanning optical microscope lithography. The 2D PhC structures prepared in GaAs surface were used as a mold for nanoimprint lithography in polymethylmethacrylate.

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“…The method consists in employing the NSOM in illumination mode, where patterning of structures is done through a direct writing process which is performed by the optical near-field produced at the tip of a fiber probe [12][13][14].…”

Section: Introductionmentioning

confidence: 99%

Irregular 2D structure in the light emitting diode surface patterned by NSOM lithography

et al. 2012

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In this paper, we present near-field scanning optical microscope (NSOM) in illumination mode as effective tool for semiconductor device surface patterning. In the illumination mode, the non-contact mode of the NSOM lithography is performed, where the fiber probe exposes defined spots in thin photoresist layer. As the scanning technique allows irregular two-dimensional patterning of different surfaces, this was applied on the GaAs/AlGaAs based light emitting diode surface. Patterned surface was analyzed by optical microscope and atomic force microscope.Keywords-near-field scanning optical microscope lithography, irregular 2D structure, light emitting diode surface patterning, photonic structure.

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Near-field optical lithography method for fabrication of the nanodimensional objects

Cited by 24 publications

References 8 publications

Plasmonic Nanolithography: A Review

Plasmonic Nanolithography: A Review

Advanced optical methods for patterning of photonic structures in photoresist, III-V semiconductors and PMMA

Irregular 2D structure in the light emitting diode surface patterned by NSOM lithography

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