The mechanisms responsible for and controlling the growth of tungsten nano-tendrils (or "fuzz") under low-energy helium plasma exposure remain unclear. For the first time in nanotendril experiments, the plasma sheath-produced electric field and the helium (He) ion energy have been decoupled, showing that the sheath electric field has little impact on nano-tendril growth, eliminating a possible cause for tendril growth. The well-established necessary growth conditions for W fuzz were maintained with He ion flux density Γ He > 10 21 He m -2 s -1 , surface temperature T s = 1273 K, He ion energy E He = 64 eV, and He ion fluence Φ He > 10 24 He m -2 . A grid is situated between the tungsten sample and plasma, with the grid and sample potentials independently controlled in order to control the electric field at the surface of the sample while maintaining the same incident He ion energy to the surface. A calculation of the potential profile in the drift space between the grid and sample was used to account for space charge and calculate the electric field at the surface of the sample. Tungsten fuzz formed at all electric fields tested, even near zero electric field. Also, the depth of the resulting W fuzz layer was unaltered by the electric field when compared to the calculated depth determined from an empirical growth model. The conclusion is that the sheath electric field is not necessary to cause the changes in surface morphology.