“…Owing to the similar ionic radii of Ga 3+ (0.062 nm) and Zn 2+ (0.074 nm), Zn alloying/doping has been widely used to improve the performance of Ga 2 O 3 , 31–35 and some results show that the oxygen vacancy defects can be significantly suppressed by introducing Zn into Ga 2 O 3 . 36,37 However, most previously studies have focused on the most stable β-Ga 2 O 3 , while relatively few studies have been conducted on other metastable phases; 38,39 in particular, Zn-doped ε-Ga 2 O 3 has still not been reported. In this work, oxygen-vacancy-free ε-Ga 2 O 3 film was epitaxially grown on a c -sapphire substrate using metal organic chemical vapor deposition (MOCVD) by introducing 6.34 at% Zn and face-to-face post-annealing in oxygen.…”