2020
DOI: 10.1149/2162-8777/aba407
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Neutron Irradiation of AlGaN Polarization Doped Field Effect Transistors

Abstract: AlGaN polarization doped field effect transistors (POLFETs) were irradiated with neutrons at an average energy of 4.5 MeV and doses of 5 × 1010 n/cm−2 and 5 × 1011 n/cm−2. Only 1% and 3% reduction in DC current was noted at these fluences, respectively. Drain and gate leakage current was only found to have degraded at 5 × 1011 n/cm−2, lower fluences producing nominal changes. 100 kHz operation demonstrated near ideal performance prior to irradiation, and only slight degradation after for most stringent duty cy… Show more

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“…Defects formed during manufacturing or by irradiation, as well as interfaces, may trap electrons and holes, resulting in charged defect states. At low ion fluences (<10 12 ions cm −2 , depending on ion energy and mass), damage regions from individual ions do not overlap, and the response to ions of specific mass and energy can be characterized in situ or ex situ using the known density of ion events and a variety of techniques, 44,[196][197][198][199][200][201][202][203][204][205][206][207][208][209][210][211] such as scanning transmission electron microscopy (STEM) to determine the nature and concentration of damage/defects. While amorphous tracks are not expected to form in the wide bandgap and ultra-wide bandgap semiconductors, local compositional variations, defects and strain fields are expected along the ion trajectories.…”
Section: Total Dose and Single Event Upsetmentioning
confidence: 99%
“…Defects formed during manufacturing or by irradiation, as well as interfaces, may trap electrons and holes, resulting in charged defect states. At low ion fluences (<10 12 ions cm −2 , depending on ion energy and mass), damage regions from individual ions do not overlap, and the response to ions of specific mass and energy can be characterized in situ or ex situ using the known density of ion events and a variety of techniques, 44,[196][197][198][199][200][201][202][203][204][205][206][207][208][209][210][211] such as scanning transmission electron microscopy (STEM) to determine the nature and concentration of damage/defects. While amorphous tracks are not expected to form in the wide bandgap and ultra-wide bandgap semiconductors, local compositional variations, defects and strain fields are expected along the ion trajectories.…”
Section: Total Dose and Single Event Upsetmentioning
confidence: 99%