10×10 photodiode array fabricated on Si and Kapton ® substrateThe 10×10 thin-film In 0.53 Ga 0.47 As p-i-n photodiode arrays are fabricated on both a 500 µm thick semi-insulating Si substrate and a 25 µm thick E-type Kapton ® foil. The fabrication processes of 10×10 arrays are similar to that of the 8×100 photodiode array, although the photodiode dimensions are different. For the 10×10 arrays, the top ring contacts have 20 µm/30 µm inner/outer diameters that define the light detection area. Photodiode mesa diameters are 40 µm, with 100 µm pixel separations. The back side linear contacts are 5 µm wide to connect the photodiode rows, and top linear contact columns are also 5 µm wide. A MgF 2 (81 nm)/TiO 2 (113