1999
DOI: 10.1117/12.360538
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New high-performance complementary bipolar technology featuring 45-GHz NPN and 20-GHz PNP devices

Abstract: A new high performance silicon complementary bipolar technology is introduced. In addition a novel process "enhancement" technique based on a local oxidation is described and demonstrated and NPN devices with cut-off frequencies up to 45GHz and PNP devices of 20GHz have been fabricated. We propose that the technique we have used will allow specific transistors within a circuit to be optimised, as required.

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“…The first method involves optimization by consuming surface epitaxial silicon using a "sacrificial oxidation" technique [3]. The sacrificial oxidation technique is analogous to that of the selective implanted collector but with the advantage of superior control and manufacturability.…”
Section: Experimental Details and Resultsmentioning
confidence: 99%
“…The first method involves optimization by consuming surface epitaxial silicon using a "sacrificial oxidation" technique [3]. The sacrificial oxidation technique is analogous to that of the selective implanted collector but with the advantage of superior control and manufacturability.…”
Section: Experimental Details and Resultsmentioning
confidence: 99%