The main horizontal well completion issues have been identified and addressed during the previous decades, resulting in wells with better performance, lower water production and higher recovery efficiencies. One of the most important issues has been inflow equalization, which is affected by reservoir heterogeneities and pressure losses in the completion (annulus and liner). Evaluations of the flow equalization, in sandstone and natural fracture reservoirs, along horizontal wells have shown the importance of this technique to improve reservoir management.Passive inflow control device (PICD) performance in producer and injector wells under different fluid properties (density and viscosity) and operational conditions will be presented to show the technical benefits of this technique as well as their improved recovery efficiencies when compared to non-PICD completions. The quantification of the benefits of this completion technique was performed using a fully integrated reservoir simulator where the PICD flow performance characteristic, well completion description (packers, blank pipe, gravel pack, annulus flow, etc.), and reservoir simulation are considered.Lessons learned and best practices regarding equipment selection and specification acquired during the last 10 years are summarized to define potential PICD applications in horizontal wells. Finally, the field experiences and numerical simulation results are analyzed to establish the best well completion strategy to fit specific reservoir conditions.
SPE 124349
PICD Design CharacteristicsThe primary factor in maintaining a uniform influx is the ability of the device to resist erosion from fluid-borne particles that pass through the screen. Screens are not designed to prevent 100% blockage of all particles from the formation. During production, formation fines that are produced through the screen also pass through the PICD. These fines can and will erode a PICD over time if the fluid velocity is high enough and fines are in the flow stream. The rate of erosion will depend on the following factors: particle size, particle concentration, and fluid velocity. The first two factors are dependent on well conditions, while the third is dependent on PICD geometry and design.Currently, there are two major different types of PICD designs in the industry: orifice/nozzle-based (restrictive) and helical-channel/labyrinth pathway (frictional). They use two different methods to achieve a uniform inflow profile. The orifice-based PICD uses fluid constriction to generate a differential pressure across the device. This method essentially forces the fluid from a larger area down through small-diameter ports, creating a flow resistance. This overall change in pressure is what allows the PICD to function.The helical-channel ( Fig. 1) and labyrinth pathway PICDs, however, use surface friction to generate a similar pressure drop. The helical channel design is one or more flow channels that are wrapped around the basepipe of the screen. The labyrinth design uses a tortuous pathway to cre...