New materials for 157-nm photoresists: characterization and properties

Crawford, M. K.; Feiring, Andrew E.; Feldman, Jerald; French, Roger H.; Periyasamy, M.; Schadt, Frank L.; Smalley, Robert; Zumsteg, F. C.; Kunz, Roderick R.; Rao, Veena; Liao, Ling; Holl, Susan M.

doi:10.1117/12.388319

Cited by 31 publications

(25 citation statements)

References 5 publications

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“…We [3] and others [9,10] have reported imaging results with TFE copolymers with optical absorbances in the range of 2.0 µm"1, or slightly lower, based upon terpolymers composed of TFE, hexafluoroisopropanol-functionalized NB, and a protected acid-labile carboxylate ester. Here we will describe some of those results, and then several recent imaging results with resists having formulated absorbances as low as 1.4 µm"1.…”

Section: Resist Contrast and Imaging 321 Tfe Terpolymersmentioning

confidence: 92%

“…3.1.1 TFE Copolymers 3.1.1.1 Effect of TFE Incorporation on Optical Absorption Incorporating TFE into the backbone of copolymers has a powerful effect on the 157 nm absorbance of resist resins [2,3]. In Figure 3 we show two spectra, one of a VA copolymer of functionalized norbornenes, and the other of the same functionalized norbornenes but with some TFE copolymerized in the backbone.…”

Section: Example 70 Nmmentioning

confidence: 99%

“…The 157 nm absorbance has decreased signs scantly as a result of the TFE incorporation. This result initially stimulated our interest in the use of TFE copolymers as resins for 157 nm photoresists [2,3].…”

Section: Example 70 Nmmentioning

confidence: 99%

“…VA addition polymers are a second platform that has been considered for 157 nm resist resins [3,4]. As described above, these polymers have a distinct disadvantage in optical absorbance compared with TFE copolymers.…”

Section: Va Polymersmentioning

confidence: 99%

“…The development of increasingly more transparent fluoropolymers for 157 nm lithography is an ongoing activity in a number of research laboratories around the world [3][4][5][6][7], leading to considerable progress in that direction during the past four years.…”

Section: Introductionmentioning

confidence: 99%

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Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists.

Crawford

Farnham

Feiring

et al. 2002

J. Photopol. Sci. Technol.

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Implementation of 157 nm lithography using single-layer photoresists will require the development of resists with sufficiently high transparency in the vacuum ultraviolet to permit high resolution imaging using films approximately 200 nm thick. One of the more promising approaches to this objective involves the use of fluoropolymers as the base resins in the photoresists, since fluorination decreases the optical absorbance at 157 nm. Here we describe the optical properties and imaging performance of two fluoropolymer systems. One system is based upon tetrafluoroethylene copolymers, the other upon vinyl addition copolymers. Both systems incorporate norbornene derivatives to provide aqueous base (developer) solubility and plasma etch resistance.

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Section: Resist Contrast and Imaging 321 Tfe Terpolymersmentioning

confidence: 92%

Section: Example 70 Nmmentioning

confidence: 99%

Section: Example 70 Nmmentioning

confidence: 99%

Section: Va Polymersmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists.

Crawford

Farnham

Feiring

et al. 2002

J. Photopol. Sci. Technol.

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Time-Dependent Density Functional Theory Calculations of Photoabsorption of Fluorinated Cyclic Molecules in the Vacuum Ultraviolet Region

Dixon

Matsuzawa

Ishitani

et al. 2001

phys. stat. sol. (b)

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Subject classification: 71.15.Mb; 78.40.Me; S12Time-dependent density functional theory (TD-DFT) calculations of the photoabsorption of molecules in the vacuum ultraviolet region have been performed in order to aid in the design of transparent materials for use as photoresists for F 2 lithography (157 nm). The method including an empirical equation for correcting the calculated transition energy is described. We have used the TD-DFT approach to predict the photoabsorption of substituted benzenes, and cycloalkanes including norbornane. The calculations show that norbornane is the best cycloalkane on which to start substitution studies. We report results on the mono-, di-, and tetra-fluorinated derivatives. The results show that the tetrafluoro-norbornanes have the lowest absorption in the 157 nm range for the molecules that we studied.

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