2013 IEEE International Electron Devices Meeting 2013
DOI: 10.1109/iedm.2013.6724731
|View full text |Cite
|
Sign up to set email alerts
|

New observations on complex RTN in scaled high-κ/metal-gate MOSFETs — The role of defect coupling under DC/AC condition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
8
0

Year Published

2014
2014
2020
2020

Publication Types

Select...
3
2
1

Relationship

0
6

Authors

Journals

citations
Cited by 19 publications
(8 citation statements)
references
References 4 publications
0
8
0
Order By: Relevance
“…The number of traps present is proportional to device area and the single trap impact is inversely proportional to it 44,45 . It is also often observed that RTN is not always consistent where some traps may only be active when a dominating trap is in a certain state 46 . This can result in Id measurements like or similar to Fig.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The number of traps present is proportional to device area and the single trap impact is inversely proportional to it 44,45 . It is also often observed that RTN is not always consistent where some traps may only be active when a dominating trap is in a certain state 46 . This can result in Id measurements like or similar to Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The maximum Vg is 1.2 V. The Vd can be adjusted between 0.1 V and 0.5 V to achieve the optimal result. The effect of Vg and Vd on RTN traps has also been studied previously 46,51 . Typically, an increase in Vg will decrease the capture time and increase the emission time with a given Vd and the exact relationship being highly device dependant.…”
Section: Discussionmentioning
confidence: 99%
“…To explain the obtained results in which the appearance probability and amplitude of RTN were changed statistically by the drain current conditions, we consider the channel percolation model. [24][25][26][27][28][29] Owing to the effects of random discrete dopants in the channel and other random fluctuations of device parameters, the Si surface potential fluctuates. This results in forming one or several channel percolation paths that dominate the current flow from source to drain.…”
Section: Resultsmentioning
confidence: 99%
“…26) From the atomistic technology computer aided design (TCAD) simulation, it is reported that the number of percolation paths increases as the gate overdrive voltage increases, i.e., the drain current increases. 29) Figure 10 shows a schematic illustration of the impacts of drain current on the appearance probability and amplitude of RTN. Here, we consider the two cases in each range of the Gumbel plot under the large (20 µA) and small (0.1 µA) drain current conditions shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation