New system for fast submicron optical direct writing

Seltmann, Rolf; Doleschal, Wolfgang; Gehner, Andreas; Heinz, Kuehn; Melcher, R.; Paufler, J.; Zimmer, G.

doi:10.1016/0167-9317(95)00209-x

Cited by 12 publications

(6 citation statements)

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“…16 By adjusting the dosage of laser beam for each pattern at different points on the mask, proximity effect can be reduced. 17 If the pattern has features very close to each other, less than 1 μm, then there is a possibility of features merging with each other. The feature size and structure also varies during the development time.…”

Section: Resultsmentioning

confidence: 99%

Fabrication of back contacts using laser writer and photolithography for inscribing textured solar cells

2015

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Semiconductor fabrication process begins with photolithography. Preparing a photo mask is the key process step in photolithography. The photo mask was fabricated by inscribing patterns directly onto a soda lime glass with the help of a laser beam, as it is easily controllable. Laser writer LW405-A was used for preparing the mask in this study. Exposure wavelength of 405 nm was used, with which 1.2 μm feature size can be written in direct write-mode over the soda lime glass plate. The advantage of using the fabricated mask is that it can be used to design back contacts for thin film Photovoltaic (PV) solar cells. To investigate the process capability of LW405-A, same pattern with different line widths was written on soda lime glass samples at different writing speeds. The pattern was inscribed without proximity effect and stitching errors, which was characterized using optical microscope and field emission scanning electron microscope (FE-SEM). It was proven that writing speed of a mask-writer is decided according to the intended feature size and line width. As the writing speed increases, the edges of the patterns become rougher due to uneven scattering of the laser beam. From the fabricated mask, the solar cell can be developed embedding both the contacts at the bottom layer, to increase the absorption of solar radiation on the top surface effectively by increasing light absorption area.

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Section: Resultsmentioning

confidence: 99%

Fabrication of back contacts using laser writer and photolithography for inscribing textured solar cells

2015

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“…The LDW system based on laser‐spot‐writing has the advantage of a simple setup, but the writing speed is limited to around 5 mm s −1 , preventing it from large‐area fabrication. To solve this problem, Seltmann et al proposed the use of an electronically programmable spatial light modulator (SLM) to replace the single laser spot for parallel patterning . The instrumental setup is schematically shown in Figure b, where the laser beam irradiates the SLM and an imaging system composing of a Fourier lens is used to project the image onto the wafer.…”

Section: Maskless Nanofabrication Techniquesmentioning

confidence: 99%

Toward Scalable Flexible Nanomanufacturing for Photonic Structures and Devices

et al. 2016

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Continuous and scalable nanopatterning over flexible substrates is highly desirable for both commercial and scientific interests, but is difficult to realize with traditional photolithographic processes. The recent advancements in nanofabrication methodologies enable light management with photonic structures on flexible materials, providing an increasingly popular strategy to control the light harvesting in the optoelectronic devices of photovoltaics, and in organic and inorganic light-emitting diodes. Here, the current status of nanopatterning technologies for the fabrication of optoelectronic devices is summarized. Scalable nanopatterning technologies for nanomanufacturing on flexible materials are emphasized. Critical challenges in various patterning techniques when considering the resolution, scalability, processing throughput, and the use of masks and resists are addressed. The integration of flexible nanopatterned substrates with light manipulation in organic optoelectronic devices is also discussed; this enables the control of light flux and spectra. Finally, potential development directions are highlighted.

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“…And the throughput has been greatly improved at meters per second or square centimeter per second. Table 2 compares 1 Laser-guided direct-write (LGDW).…”

Section: Testing and Conclusionmentioning

confidence: 99%

“…Laser direct-writing (LDW) maskless lithography was proposed with the rise of binary optics in the 1980s because of its advantages, such as high precision, low cost, high speed, and high flexibility [1]. LDW is a well-established and widely used technique for the fabrication of binary optical masks or elements, such as photonic crystal structures, chirp grates, and optical microelectromechanical systems [2,3].…”

Section: Introductionmentioning

confidence: 99%

High-Speed Transmission and Mass Data Storage Solutions for Large-Area and Arbitrarily Structured Fabrication through Maskless Lithography

Wang

2016

Journal of Electrical and Computer Engineering

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This paper presents the implementation aspects and design of high-speed data transmission in laser direct-writing lithography. With a single field programmable gate array (FPGA) chip, mass data storage management, transmission, and synchronization of each part in real-time were implemented. To store a massive amount of data and transmit data with high bandwidth, a serial advanced technology attachment (SATA) intellectual property (IP) was developed on Xilinx Virtex-6 FPGA. In addition, control of laser beam power, collection of status read back data of the lithography laser through an analog-to-digital converter, and synchronization of the positioning signal were implemented on the same FPGA. A data structure for each unit with a unique exposure dose and other necessary information was established. Results showed that the maximum read bandwidth (240 MB/s) and maximum write bandwidth (200 MB/s) of a single solid-state drive conform to the data transmission requirement. The total amount of data meets the requirement of a large-area diffractive element approximately 102 cm2. The throughput has been greatly improved at meters per second or square centimeter per second. And test results showed that data transmission meets the requirement of the experiment.

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New system for fast submicron optical direct writing

Cited by 12 publications

References 0 publications

Fabrication of back contacts using laser writer and photolithography for inscribing textured solar cells

Fabrication of back contacts using laser writer and photolithography for inscribing textured solar cells

Toward Scalable Flexible Nanomanufacturing for Photonic Structures and Devices

High-Speed Transmission and Mass Data Storage Solutions for Large-Area and Arbitrarily Structured Fabrication through Maskless Lithography

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