1988
DOI: 10.1093/earlyj/xvi.4.523
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“…While CVD has been used to deposit films of both Ru and RuO 2 , the identification of suitable ruthenium precursors, acceptable process methodologies, and film quality remain significant issues. The precursor systems studied to date have been almost exclusively based on cyclopentadiene (or ethyl derivatives ), carbonyl, β-diketonate ligands, or combinations of various mixed ligand systems. Work has also been carried out using highly toxic RuO 4 species. , Typically, CVD depositions employ an oxidizing environment, which can prove to be problematic for some substrates such as Ta 39 and can lead to unacceptable levels of oxygen contamination in the film. Film purity has also been an issue due to carbon contamination from ligand decomposition products.…”
Section: Introductionmentioning
confidence: 99%
“…While CVD has been used to deposit films of both Ru and RuO 2 , the identification of suitable ruthenium precursors, acceptable process methodologies, and film quality remain significant issues. The precursor systems studied to date have been almost exclusively based on cyclopentadiene (or ethyl derivatives ), carbonyl, β-diketonate ligands, or combinations of various mixed ligand systems. Work has also been carried out using highly toxic RuO 4 species. , Typically, CVD depositions employ an oxidizing environment, which can prove to be problematic for some substrates such as Ta 39 and can lead to unacceptable levels of oxygen contamination in the film. Film purity has also been an issue due to carbon contamination from ligand decomposition products.…”
Section: Introductionmentioning
confidence: 99%