2009
DOI: 10.1016/j.jcrysgro.2009.01.083
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Ni behaviors in polycrystalline silicon with disk-shaped grains

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Cited by 2 publications
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“…In a previous study, nickel ranging between 10 12 and 10 14 cm À2 on a-Si for the crystallization gave the disk-shaped grains. 22) Here, the SiN x layer is a stable insulating material and thus does not react with nickel. After the deposition of Ni, the films were thermally annealed in N 2 ambient atmosphere.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…In a previous study, nickel ranging between 10 12 and 10 14 cm À2 on a-Si for the crystallization gave the disk-shaped grains. 22) Here, the SiN x layer is a stable insulating material and thus does not react with nickel. After the deposition of Ni, the films were thermally annealed in N 2 ambient atmosphere.…”
Section: Experimental Methodsmentioning
confidence: 99%