1986
DOI: 10.1016/0039-6028(86)90271-2
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Nickel-chromium interface resolution in Auger depth profiles

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Cited by 37 publications
(6 citation statements)
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“…4,5 Other ion species such as xenon or neon have been used as an alternative for ion sputter cleaning of samples, but the degradation has only limited improvement. 6 It has been discovered recently that buckminsterfullerene C 60 ions cause less atomic mixing of samples in timeof-flight SIMS experiments 7,8 and molecular dynamics calculation. 9 In order to develop a precleaning technique that causes less damage, we applied a C 60 ion beam for sputter analysis and compared the damage with practical argon ion beams.…”
Section: Introductionmentioning
confidence: 99%
“…4,5 Other ion species such as xenon or neon have been used as an alternative for ion sputter cleaning of samples, but the degradation has only limited improvement. 6 It has been discovered recently that buckminsterfullerene C 60 ions cause less atomic mixing of samples in timeof-flight SIMS experiments 7,8 and molecular dynamics calculation. 9 In order to develop a precleaning technique that causes less damage, we applied a C 60 ion beam for sputter analysis and compared the damage with practical argon ion beams.…”
Section: Introductionmentioning
confidence: 99%
“…Such a sputter-induced chemical transformation is still observable at low beam energy 7 and with other ion species. 8 For example, organic sulfonates in poly(styrene sulfonate) (PSS) are transformed to thiols by 0.2 kV Ar + sputtering, 7 ester groups in poly(ethylene terephthalate) (PET) are preferentially removed by 0.5 kV Ar +9 or 0.4 kV O + , 10 and C]O groups in poly(methyl methacrylate) (PMMA) are reduced into C-O groups by Ar plasma. 11 Buckminsterfullerene (C 60 ) ions have recently been used to sputter materials for studying organic thin films in XPS.…”
Section: Introductionmentioning
confidence: 99%
“…Such damage is still observable at low (0.2 kV) beam energy 2 and with other ion species. 3 Recently, buckminsterfullerene (C 60 ) ion guns were constructed by Ionoptika Ltd. 4,5 and were used to remove the surface layer of specimens. With the use of C 60 + sputtering as the ion source for secondary ion mass spectrometry (SIMS) [6][7][8] and to remove the surface layer for XPS depth profiling, 2,4,9 a few reports have confirmed that the sputtering yield is increased and the damage to the chemical structure is reduced.…”
mentioning
confidence: 99%
“…Hence, information about the newly exposed surface is lost and argon sputtering cannot be used for depth profiling organic materials. Such damage is still observable at low (0.2 kV) beam energy and with other ion species …”
mentioning
confidence: 99%