1992
DOI: 10.1021/bk-1992-0482.ch006
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Nickel Monoxide Surface Films on Ni(100)

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Cited by 7 publications
(7 citation statements)
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“…The absolute minimum of2.4 ML that we fmd is furthermore inconsistent with the saturation coverage of 2.45 ML found recently by Pope et al using nuclear reaction analysis [18], since the presence of any reasonable attenuation in the oxide overlayer in XPS would yield a higher value than 2.45. Our value of 4.7 ML with overlayer attenuation is however, consistent with, although somewhat higher than, a very recent XPS study of 0/Ni(OOl) by Hallet al [30], who find a 4-ML thickness for the Ni0(001) orientation that we find to be dominant at saturation.…”
Section: Quantitative Analysis Of Surface Coverages-supporting
confidence: 92%
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“…The absolute minimum of2.4 ML that we fmd is furthermore inconsistent with the saturation coverage of 2.45 ML found recently by Pope et al using nuclear reaction analysis [18], since the presence of any reasonable attenuation in the oxide overlayer in XPS would yield a higher value than 2.45. Our value of 4.7 ML with overlayer attenuation is however, consistent with, although somewhat higher than, a very recent XPS study of 0/Ni(OOl) by Hallet al [30], who find a 4-ML thickness for the Ni0(001) orientation that we find to be dominant at saturation.…”
Section: Quantitative Analysis Of Surface Coverages-supporting
confidence: 92%
“…It is also worth noting in concluding our discussion of the annealed oxide that our annealing temperature of approximately 523 K is, according to a recent XPS study by Hall et al [30], probably not high enough to produce significant oxide layer thickening that can, for temperatures of 100 K or more above this, lead to oxide islands of as much as 50 A in thickness.…”
Section: Structure Of Ni0(001) On Ni(001)-mentioning
confidence: 74%
“…The growth and surface characteristics of Ni͑100͒/NiO͑100͒ thin film substrates have previously been well studied. 13,[23][24][25][26][27] The growth of the ordered thin film of NiO͑100͒ on the Ni͑100͒ substrate was monitored with several techniques. HREELS was used to detect the characteristic Fuchs-Kliewer phonon at 69.6 meV ͑561 cm Ϫ1 ͒ 13 described more fully below.…”
Section: Nio"100…mentioning
confidence: 99%
“…3 The Ni(100) crystal was purchased from Metal Crystals and Oxides and cleaned by using a standard procedure. The c(2x2)_O/Ni(100) surface was prepared by exposing the Ni (100) surface to 40 L of oxygen at 300 K. 6 (1 L corresponds to 10 −6 torr·sec exposure) The NiO(111) surface was produced by exposing the Ni (100) surface to 300 L of oxygen at 300 K. 7 Gases were introduced to the analysis chamber using a leak valve.…”
mentioning
confidence: 99%