Aluminum films with thicknesses ranging from 1 nm to 12 nm have been sputtered on 20 nm thick Co layers. The properties of the Co/Al bilayers were studied by X-ray photoemission spectroscopy (XPS) and spin-echo nuclear magnetic resonance (NMR). Both methods show independently that a 1 nm Al film covers the Co surface completely. XPS and NMR also showed that layers thicker than 1 nm Al are not oxidized completely in ambient air. Similarities to and deviations from niobium with Al overlayers (Nb/Al) are described. Prerequisites for the fabrication of tunneling magnetoresistance devices based on Co or NiFe ferromagnets and an aluminum oxide barrier are discussed.
PACS: 82.80.Ch; 82.80.Pv; 68.55.-aResearch on magnetoresistance has been particularly active since the discovery of the giant magnetoresistance (GMR) effect in layered magnetic systems [1,2]. In recent years magnetic tunnel junctions (MTJ) have emerged as another source of large magnetoresistance effects [3][4][5][6]. Such devices consist of a ferromagnetic (FM) top and bottom electrode separated by an insulating layer (I) and show large changes in resistance when a magnetic field turns the relative orientation of the magnetization of the ferromagnetic electrodes from parallel to anti-parallel.Although the phenomenon of tunneling magnetoresistance (TMR) in ferromagnetic junctions was already identified more than two decades ago by Julliere [7], it is only recently that one has been able to grow junctions with reproducible characteristics and significant changes in the magnetoresistance (20%) at room temperature [3,5]. The (compared to GMR systems) inherent high absolute resistance -because of the tunneling effect -and the therefore easily measurable magnetoresistance give them a high potential for low-power * Present address: magnetic field sensors [8,9] and nonvolatile magnetic random access memory (MRAM) [10,11].The quality of tunnel junctions and the reproducibility in fabrication in general depend critically on the properties of the, typically, 1 nm to 2 nm thin insulating tunnel barrier. Tunneling is moreover extremely surface sensitive in that it displays the band structure of the electrode surface very close to the barrier insulator. Good barrier uniformity without pinholes is the key aspect to obtain current-voltage (I-V ) characteristics with low leakage currents. These conditions are not fulfilled for all barrier materials. It tends to be difficult to form high-quality and highly insulating tunnel barriers in many cases, especially if a transition metal is used as the base electrode. The native oxides and sub oxides of transition metals often show poor insulating properties [12], which are undesirable for many electronic applications. These problems have also been experienced in, for example, superconducting Nb/NbO x /Nb tunnel junctions [13]. Some of the Nb suboxides showed metallic properties and lead to microshorts. A decade ago, 'artificial' barriers were demonstrated to be a successful solution [14]. Artificial refers in this context to tunne...