2009
DOI: 10.4028/www.scientific.net/msf.615-617.45
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Nitrogen Doping of 3C-SiC Single Crystals Grown by CF-PVT

Abstract: We present a structural and optical investigation of nitrogen-doped single crystals of cubic silicon carbide prepared by the continuous feed - physical vapour transport method. Self-nucleated crystals were produced which exhibited well faceted square and triangular shapes. KOH etching was used to characterize the structural defects, like stacking faults and dislocations. The effect of changing the nitrogen flow rate on the different crystalline orientations was investigated by Raman spectroscopy and low temper… Show more

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Cited by 5 publications
(8 citation statements)
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“…Generally, these pits were related to Ds. 22,25,26 For the intrinsic sample (2 × 10 16 atom/cm 3 ), we observe a constant value of about 120 cm −2 , along all thicknesses. For all doped samples, instead, at about 10 μm from the removed silicon interface (black squares), the density of the etched pits is in the range between 5.5 × 10 2 and 3.0 × 10 3 cm −2 , and it increases by enhancing the nitrogen concentration.…”
Section: ■ Results and Discussionmentioning
confidence: 65%
See 2 more Smart Citations
“…Generally, these pits were related to Ds. 22,25,26 For the intrinsic sample (2 × 10 16 atom/cm 3 ), we observe a constant value of about 120 cm −2 , along all thicknesses. For all doped samples, instead, at about 10 μm from the removed silicon interface (black squares), the density of the etched pits is in the range between 5.5 × 10 2 and 3.0 × 10 3 cm −2 , and it increases by enhancing the nitrogen concentration.…”
Section: ■ Results and Discussionmentioning
confidence: 65%
“…Figure shows the density of the diamond-shaped etched pits as a function of the nitrogen concentration. Generally, these pits were related to Ds. ,, …”
Section: Results and Discussionmentioning
confidence: 89%
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“…CVD is the most commonly used growth method and involves three general steps: (i) hydrogen surface etching to remove any native oxide; (ii) a carbonization process to form a buffer (sealing) layer; and (iii) the supply of gases to grow the 3C‐SiC layer . CVD growth parameters such as temperature, deposition rate, and pressure greatly impact the quality of the as‐grown 3C‐SiC films . Modification of these parameters and the growth steps have led to the production of very high quality monocrystalline films .…”
Section: Heteroepitaxy Of 3c‐sic On Simentioning
confidence: 99%
“…The N incorporation is as follow: (111)-C face > (100) face > (111)-Si face. The incorporation difference is all the more important than the nitrogen flow rate is high in the gas phase [25].…”
Section: In-situ N-type Dopingmentioning
confidence: 99%