Noise-reduced electroless deposition of arrays of copper filaments

Weng, Yuyan; Si, Jian-Wen; Gao, Wenting; Wu, Zhe; Wang, Mu; Peng, Ru‐Wen; Ming, Nai‐Ben

doi:10.1103/physreve.73.051601

Cited by 11 publications

(15 citation statements)

References 50 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…43,46 The thickness of this ultrathin electrolyte layer is on the order of 200nm, which depended on the temperature and the initial concentration of electrolyte. 42 In our electrodeposition process a potentiostatic voltage of 1.5 V was applied across the electrodes. The cobalt filaments initiated from the cathode and grew towards the anode in the ultrathin electrolyte layer trapped between the ice and the substrate.…”

Section: Experimentalsmentioning

confidence: 99%

See 1 more Smart Citation

Periodic magnetic domains in single-crystalline cobalt filament arrays

et al. 2016

Self Cite

View full text Add to dashboard Cite

Magnetic structures with controlled domain wall pattern may be applied as potential building blocks for three-dimensional magnetic memory and logic devices. Using a unique electrochemical self-assembly method, we achieve regular single-crystalline cobalt filament arrays with specific geometric profile and crystallographic orientation, and the magnetic domain configuration can be conveniently tailored. We report for the first time the transition of periodic anti-parallel magnetic domains to a compressed vortex magnetic domains depending on the ratio of height vs. width of the wires. A "phase diagram" is obtained to describe the dependence of the type of magnetic domains and the geometrical profiles of the wires. Magnetoresistance of the filaments demonstrates that the contribution of series of 180 o domain walls is over 0.15% of the zero-field resistance ρ(H = 0). These self-assembled magnetic nanofilaments, with controlled periodic domain patterns, offer an interesting platform to explore domain-wall-based memory and logic devices.

show abstract

Section: Experimentalsmentioning

confidence: 99%

“…The entire setup was sealed in a copper chamber cooled by a thermostat, similar to that reported earlier. [39][40][41][42][43][44][45] The temperature of the thermostat could be controlled between −20…”

Section: Experimentalsmentioning

confidence: 99%

Periodic magnetic domains in single-crystalline cobalt filament arrays

et al. 2016

Self Cite

View full text Add to dashboard Cite

show abstract

“…When equilibrium was eventually reached at the set temperature (À4 8C, for example), an ultrathin layer of concentrated electrolyte remained unsolidified between the ice of electrolyte and the patterned silicon substrate. The thickness of this ultrathin layer depended on temperature, initial concentration of electrolyte, and amount of electrolyte solution in the deposition cell [23,36]. In our system, the typical thickness of this layer was of the order of several hundreds of nanometers.…”

Section: Methodsmentioning

confidence: 99%

Creating In‐Plane Metallic‐Nanowire Arrays by Corner‐Mediated Electrodeposition

et al. 2009

Self Cite

View full text Add to dashboard Cite

Metallic microstructures are the essential building blocks in microelectronics as electric interconnection between different functioning parts. [1] In the blooming field of optoelectronics, metallic microstructures also play a key role due to surfaceplasmon-plariton-related effects, [2,3] applications in miniaturization of photonic circuits, [4,5] near-field optics, [6] and singlemolecule optical sensing. [7,8] The electromagnetic resonance in metallic microstructures may offer unique properties that do not exist in natural materials, such as negative refractive index. [9,10] In previous studies, metallic microstructures were usually fabricated by photolithography, which was time-consuming and costly. [11] Template-assisted electrodeposition is an easy way to fabricate microstructures. For example, anodic aluminum oxide (AAO) [12][13][14] and polymeric membranes [15] have been used as molds, and the size of the channels in these systems can reach a few nanometers.[16] However, the destructivity in removal template renders it difficult to preserve the spatial order among the nanowires, [17,18] hence limits their applications in optoelectronics. We once introduced a selective electrodeposition method to fabricate two-dimensional metallic structures, where the substrate surface was modified by stripes of lipid monolayers, on which nucleation of metal crystallites was easier.[19] However, in that case the width of the metallic wires was limited by the geometrical shape of templates, that is, the width of metallic wires could not be tuned unless a new template was used. Furthermore, previously fabricated wires [19] were essentially flat belts lying on the substrate, which would not be effective if applied to sensors where a large specific surface area is usually expected. [20] Therefore, one of the important challenges in fabricating metallic microstructures is to find an easy, repeatable, and controllable method to meet the increasing demands in optoelectronics and plasmonics.In this communication, we report a new template-assisted electrochemical approach to fabricate arrays of metallic nanowires. Unlike conventional template-assisted growth, where the generated wires are confined by the size of template, in our case the width of the metallic wires can be tuned by changing the control parameters of electrodeposition. By imprinting polymer stripes on a silicon surface, the concave corner of polymer stripes and silicon substrate provides a preferential nucleation site for the formation of metal nanowires. The width of wires can be tuned from 25 nm to a few hundred nanometers. Further, we demonstrate that this method can be applied for fabricating more complicated structures rather than straight lines only.In our experiments, the metallic nanowires are electrodeposited with the help of polymer stripes embossed on silicon surfaces. To form the patterned substrate, a thin film of poly(methylmethacrylate) (PMMA) (mr-I 7030E M w ¼ 75 kDa) is initially spin-coated on the silicon wafer. The film thickness is about 300 nm. Th...

show abstract

“…It should be noted that the natural convection and electroconvection in growth front have important effects on the pattern formation mechanisms [17][18][19][20][21][22][23]. In order to effectively reduce the convection interference without introducing other uncontrollable factors, Wang [24][25][26][27][28]. In this work, they focused on the physical properties of deposits such as the filaments with extremely low branching rate and the film.…”

Section: Introductionmentioning

confidence: 99%