2006
DOI: 10.1016/j.apsusc.2006.02.181
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“Non-destructive” B, P and As dosimetry using normal incidence oxygen

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Cited by 4 publications
(4 citation statements)
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“…The feasibility of using ultra-shallow As and P dose determinations for quality control applications by using 500 eV O 2 + ions at normal incidence was demonstrated because the damage, basically a small, shallow crater with a nm thick layer of SiO 2 at the bottom, affected the wafer less than subsequent oxidation and patterning steps so the wafer could be returned into production after the SIMS analysis. 171 The total precision (analysis, load repeatability and non-uniformity of the sample) was within 0.26-0.7% while measured dose correlated with the nominal one at the 99.9% confidence level. The dynamic range for the P-depth profiling in high dose shallow implants was 2-3 decades.…”
Section: Quantitative Analysismentioning
confidence: 79%
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“…The feasibility of using ultra-shallow As and P dose determinations for quality control applications by using 500 eV O 2 + ions at normal incidence was demonstrated because the damage, basically a small, shallow crater with a nm thick layer of SiO 2 at the bottom, affected the wafer less than subsequent oxidation and patterning steps so the wafer could be returned into production after the SIMS analysis. 171 The total precision (analysis, load repeatability and non-uniformity of the sample) was within 0.26-0.7% while measured dose correlated with the nominal one at the 99.9% confidence level. The dynamic range for the P-depth profiling in high dose shallow implants was 2-3 decades.…”
Section: Quantitative Analysismentioning
confidence: 79%
“…The abundance sensitivity of the mass spectrometer for the measured ion beams of Lu + was examined to ensure the absence of tailing effects and interfering ion beams. The isotope fractionation of the measured 175 Lu: 176 Lu ratio was estimated with reference to the isotope fractionation of Yb, which used gravimetrically prepared solutions of the enriched isotopes 171 Yb and 176 Yb. This is the first publication in which the measured isotope ratio of Lu was corrected for isotope fractionation.…”
Section: Analytical Methodologymentioning
confidence: 99%
“…Besides the "classical" setting, where As is measured with a Cs beam under oblique incidence angle, it was shown that measurements with oxygen beam at low energy with normal or near normal incidence are also well suited for repeated measurements of As dose (Fig. 6), [12]. Doing this, a simplified SIMS instrument for process monitoring purposes -equipped with only one oxygen ion gun at fixed angle-could cover depth profiling of ultra shallow As, P and B implants as well as SiGe layer analysis.…”
Section: Depth Profiling Of Asmentioning
confidence: 99%
“…Various methods are used for arsenic measurement, including mass, optical emission, atomic absorption, atomic florescence spectrometric methods, neutron activation analysis, X ray florescence, particle induced X ray emission and secondary ion mass spectrometry. 8,[11][12][13][14][15][16][17][18][19] As the role of different chemical forms and species of the element can essentially differ, speciation analysis, metabolism and toxicity, 4,6,8,12,14,20 markers, sorbents, digestion, fractionation and extraction 15,19,[21][22][23] are of interest. From 10 to 2 percent accuracy of the measurements is often required 9,18 and methods of measurement of good reproducibility and low measurement uncertainty are highly appreciated.…”
Section: Introductionmentioning
confidence: 99%