1999
DOI: 10.1149/1.1392493
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Nondestructive Analytical Tools for Characterization of Thin Titanium Silicide Films Prepared by Conventional and Direct Step Silicidation with Enhanced Transition

Abstract: Preparation of Thin TiSi 2 Films Using DIET and theConventional Process A TiSi 2 fabrication sequence using DIET in comparison with the conventional process is shown in Fig. 1. The figure indicates that a simple coupling of Ti deposition and thermal annealing results in TiSi 2 overgrowth on the field oxide due to Si diffusion through the

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Cited by 3 publications
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“…Spectroscopic ellipsometry ͑SE͒ is one of the candidates for this purpose. [11][12][13] In this work, the formation of nickel germanide by rapid thermal annealing ͑RTA͒ was characterized by spectroscopic ellipsometry. The optical constant of NiGe film was determined and applied to NiGe film thickness measurement.…”
mentioning
confidence: 99%
“…Spectroscopic ellipsometry ͑SE͒ is one of the candidates for this purpose. [11][12][13] In this work, the formation of nickel germanide by rapid thermal annealing ͑RTA͒ was characterized by spectroscopic ellipsometry. The optical constant of NiGe film was determined and applied to NiGe film thickness measurement.…”
mentioning
confidence: 99%