Novel cleaning technology for nanoparticle removal

Tanabe, Mana; Takai, Kosuke; Otsubo, Kyo; Umezawa, Kaori; Iinuma, Minako; Kanamitsu, Shingo

doi:10.1117/12.2536471

Cited by 3 publications

(2 citation statements)

References 1 publication

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“…For the evaluation of the collapse of the fine patterns, the evaluation samples and data were obtained from Kioxia Co., Ltd., and a joint research was conducted. 22 Evaluated sample was MoSi alloy-based attenuated phase shift material of 60-nm height, isolated pattern with minimum size of 50 nm × 75 nm was used.…”

Section: Cleaning Sample and Particle Measuring Methodsmentioning

confidence: 99%

“…As reported, water infiltrates the gaps between small patterns via gas dissolution. [19][20][21] The tool and the process developed herein have been used by Tanabe et al 22 to remove particles stuck between small gaps (∼80 nm). A further investigation is required on water infiltration into all gaps with respect to the materials, shape, and surface energy.…”

Section: Model Of Freeze Cleaningmentioning

confidence: 99%

See 1 more Smart Citation

Particle and pattern discriminant freeze-cleaning method

Hattori

Matsushima²,

Demura³

et al. 2020

J. Micro/Nanolith. MEMS MOEMS

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Section: Cleaning Sample and Particle Measuring Methodsmentioning

confidence: 99%

Section: Model Of Freeze Cleaningmentioning

confidence: 99%

Particle and pattern discriminant freeze-cleaning method

Hattori

Matsushima²,

Demura³

et al. 2020

J. Micro/Nanolith. MEMS MOEMS

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Freeze point monitoring system for freeze cleaning method

Kamiya¹,

Demura²,

Nakamura³

et al. 2022

Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology

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Rapid freeze-cleaning method

Nakamura,

Kamiya,

Demura

et al. 2024

Photomask Technology 2024

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Freeze cleaning involves the selective separation of particles from the substrate surface by utilizing the volume expansion that occurs when water in a supercooling state changes to ice. This allows particles to be efficiently and easily removed without causing pattern collapse. However, this method has a long processing time because of the following two factors: (i) the particles tend to remain at the four corners of a rectangular substrate; (ii) particle removal efficiency (PRE) per freeze-thaw cycle is low. These factors necessitated 30 repetitions of the freeze-thaw cycle to obtain sufficient removability over the entire substrate surface, which prolonged the processing time. Therefore, we attempted to improve the removability at the four corners of the substrate and PRE per freeze-thaw cycle. The experimental results showed that removability at the four corners of the substrate was enhanced by improving the discharge efficiency of particles separated from the substrate. Furthermore, the PRE per freeze-thaw cycle was improved by achieving a uniform temperature distribution across the substrate at the end of supercooling. These measures reduced the processing time to 1/6 and allowed us to successfully develop a device for mass production.

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Novel cleaning technology for nanoparticle removal

Cited by 3 publications

References 1 publication

Particle and pattern discriminant freeze-cleaning method

Particle and pattern discriminant freeze-cleaning method

Freeze point monitoring system for freeze cleaning method

Rapid freeze-cleaning method

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