Novel imaging technique for non-destructive metrology and characterization of ultraviolet-sensitive polymeric microstructures

Abstract

The negative photoresist SU-8 has attracted much research interest as a structural material for creating complex three-dimensional (3D) microstructures incorporating hidden features such as microchannels and microwells for a variety of lab-on-a-chip and biomedical applications. Achieving desired topological and dimensional accuracy in such SU-8 microstructures is crucial for most applications, but existing methods for their metrology, such as scanning electron microscopy (SEM) and optical profilometry, are not practical for non-destructive measurement of hidden features. This paper introduces an alternative imaging modality for non-destructively characterizing the features and dimensions of SU-8 microstructures by measuring their transmittance of 365 nm ultraviolet (UV) light. Here, depth profiles of SU-8 3D microstructures and thin films are determined by relating UV transmittance and the thicknesses of SU-8 samples imaged in the UV spectrum through the Beer–Lambert law applied to the images on a pixel-by-pixel basis. This technique is validated by imaging the UV transmittance of several prototype SU-8 3D microstructures, including those comprising hidden hollow subsurface features, as well as SU-8 thin-films, and verifying the measured data through SEM. These results suggest that UV transmittance imaging offers a cost-effective, non-destructive technique to quickly measure and identify SU-8 microstructures with surface and hidden subsurface features unlike existing techniques.

Metrology and characterization of SU-8 microstructures using autofluorescence emission

“…Review of Scientific Instruments. 1 March 2020;91(3):033710 [18],. with the permission of AIP Publishing.…”