Novel materials by atomic layer deposition and molecular layer deposition

Leskelä, Markku; Ritala, Mikko; Nilsen, Ola

doi:10.1557/mrs.2011.240

Cited by 50 publications

(33 citation statements)

References 72 publications

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“…[1][2][3][4][5][6][7][8][9][10][11][12][13] For example, the insertion of organic or organometallic species into layered inorganic compounds can lead to original nanosized organic/inorganic, inorganic/inorganic, or bio/ inorganic functional heterostructures. [1][2][3][4][5][6][7][8][9][10][11][12][13] For example, the insertion of organic or organometallic species into layered inorganic compounds can lead to original nanosized organic/inorganic, inorganic/inorganic, or bio/ inorganic functional heterostructures.…”

Section: Introductionmentioning

confidence: 99%

Functional Hybrid Materials Based on Layered Simple Hydroxide Hosts and Dicarboxylate Schiff Base Metal Complex Guests

et al. 2012

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The insertion of carboxysalen‐type complexes into magnetic layered transition‐metal simple hydroxides has provided new hybrid compounds. Three kinds of carboxysalen ligands have been used: an ethylenediamine bridge (SED‐H2), a chiral cyclohexanediamine bridge [(S,S)‐SCD‐H2 and (R,R)‐SCD‐H2], and an aromatic o‐phenylenediamine bridge (SBD‐H2). The ccorresponding CuII, NiII, CoII, ZnII, MnIII, and AlIII complexes were synthesized and inserted into layered cobalt and copper hydroxides. The structural and spectroscopic investigations confirmed the successful insertion‐grafting of the complexes leading to new layered hybrid materials in which the inserted complexes act as pillars between the inorganic layers. The use of carboxylate anchoring functions enabled some of the difficulties encountered during the previously reported insertion of sulfonatosalen complex analogues to be overcome, namely hydrolysis and decomplexation during the insertion reaction. Hence, in this work it was possible to insert a wide variety of complexes into layered simple hydroxides, including MIII complexes, for the first time. The insertion of chiral carboxysalen complexes led to the formation of chiral magnets in which chirality transfer to the inorganic layers was evidenced and seems to be favored by the carboxylate anchoring groups. Finally, magnetic characterization showed that the copper hydroxide hybrids exhibit overall antiferrimagnetic behavior, whereas the cobalt hydroxide hybrids present ferromagnetic ordering, with ordering temperatures ranging from 6.5 to 12.8 K. In this case the nature of the cation inserted between the layers influences the magnetic behavior of the hybrid, contrary to what was observed in the case of the sulfonate analogues.

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Section: Introductionmentioning

confidence: 99%

Functional Hybrid Materials Based on Layered Simple Hydroxide Hosts and Dicarboxylate Schiff Base Metal Complex Guests

et al. 2012

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“…Within the ALD window, it is necessary that a full coverage of monolayer can be realized by the precursor pulse, and the surface reactions will stop by themselves owing to the exhaustion of surface active sites, which endows ALD with a stable GPC and makes it insensitive to any further increase of the pulse length. By this stable GPC coming from the self-limiting reactions, the uniform and ultrathin MoS 2 films can grow on the substrates even with complex structures, such as wires, powders, tubes, and holes/pores [25][26][27], which are the uniqueness of ALD. According to the crystallinity and orientation of the MoS 2 films, not only the precursors but also the substrates play an important role in ALD of MoS 2 .…”

Section: Ald Substrates Of Mosmentioning

confidence: 99%

“…The chemical reaction in time sequence can be broken by dividing a complete reaction into two halfreactions in one ALD cycle. One half-reaction cannot stop until the active sites at the surface are depleted, then beginning the other half-reaction [23][24][25][26][27]. During the ALD, the chemical reaction on a new atomic layer is directly related to the previous layer, which makes every reaction only deposit one atomic layer.…”

Section: Introductionmentioning

confidence: 99%

Recent progress in atomic layer deposition of molybdenum disulfide: a mini review

Huang

Liu

2019

Sci. China Mater.

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As a kind of specially modified chemical vapor deposition (CVD), atomic layer deposition (ALD) has long been used to fabricate thin films. The self-limiting reaction of ALD endows the films with excellent uniformity and precise controllability. The thickness of the films obtained by ALD can be controlled in an atomic scale (0.1 nm) on a large-area substrate even with complex structures. Therefore, it has recently been employed to produce the two-dimensional (2D) materials like MoS 2 . In this mini-review, the research progress in ALD MoS 2 is firstly summarized. Then the influences of precursors, substrates, temperature, and post-annealing treatment on the quality of ALD-MoS 2 are presented. Moreover, the applications of the obtained MoS 2 as an electrochemical catalysator are also described. Besides the perspective on the research of ALD of MoS 2 , the remaining challenges and promising potentials are also pointed out.

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“…Whereas ALD uses exclusively inorganic precursors to deposit solid materials, MLD uses bifunctional organic molecules in addition to the usual inorganic precursors to prepare hybrid materials. [21] [22][23] [24][25] Several MLD processes have been developed for hybrid organic-inorganic films based on metal precursors and organic alcohols to yield metal alkoxide films which are described as "metalcones". [3][4] [5][26] [27] As a prototypical example, hybrid organic-inorganic thin films based on aluminium oxide can be produced using metal alkyls a. Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork T12 R5CP, Ireland b.…”

Section: Introductionmentioning

confidence: 99%

First Principles Study of Reactions in Alucone Growth: the Role of the Organic Precursor

Muriqi¹,

Nolan

2020

Preprint

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Organic-inorganic hybrid materials are a unique class of materials with properties driven by the organic and inorganic components, making them useful for flexible devices. Molecular layer deposition (MLD) offers novel pathways for the fabrication of such hybrids by using inorganic metal precursors and the vast range of organic molecules with tunable properties. To investigate and understand the mechanism of growth a combination of theoretical and experimental data is needed. In this contribution, we present a first principles investigation of the molecular mechanism of the growth of hybrid organic−inorganic thin films of aluminium alkoxides, known as "alucones" grown by MLD. We explore the interactions between precursors by analyzing the MLD reaction products of the alumina surface terminated with Al(CH3) groups after the trimethyl aluminium pulse; this yields monomethyl-Al2O3 (Al-CH3-Al2O3) and dimethyl-Al2O3 (Al(CH3)2-Al2O3) terminated surfaces. The organic precursors are ethylene glycol (EG), diethylene glycol (DEG), triethylene glycol (TEG) and tetraethylene glycol (FEG). A detailed comparison with alucones grown with ethylene glycol (EG) and glycerol (GL) precursors is presented to assist the interpretation of experimental findings regarding the differences in the hybrid films grown by EG and GL. The results show that Al-O formation with release of methane is favorable for all precursors. EG and GL can lie flat and create so-called double reactions through the reaction of the two terminal hydroxyl groups with the surface fragments. This phenomenon removes active hydroxyl sites for EG. However, for GL the third hydroxyl group is available and growth can proceed. This analysis shows the origin of differences in thickness of alucones found for EG and GL.

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Novel materials by atomic layer deposition and molecular layer deposition

Cited by 50 publications

References 72 publications

Functional Hybrid Materials Based on Layered Simple Hydroxide Hosts and Dicarboxylate Schiff Base Metal Complex Guests

Functional Hybrid Materials Based on Layered Simple Hydroxide Hosts and Dicarboxylate Schiff Base Metal Complex Guests

Recent progress in atomic layer deposition of molybdenum disulfide: a mini review

First Principles Study of Reactions in Alucone Growth: the Role of the Organic Precursor

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