A model was built to study the rule of glancing angle deposition. This model, which is called hemisphere model, is convenient to describe how the experimental conditions influence morphology of the nanostructures prepared by GLAD. Influence of experiment conditions such as incidence angle, incidence rate, substrate temperature, and substrate rotation rate are theoretical analyzed by the hemisphere model, and validated respectively by amount of experiments. As an application of the model, metals of different melting points were deposited into coherent multi-section nanorods by adjusting substrate temperature. Glancing angle deposition (GLAD) is a physical vapor deposition method which the trajectory of incident vapor flux is not parallel to the substrate normal, but depositing at oblique angles. K. Robbie and M. J. Brett had carried out this method, 1,2) and then M. M. Hawkeye and M. J. Brett analyzed the deposition mechanism.
3-5)GLAD technique is a simple but powerful means which is capable of producing thin films with pre-designed nanostructures such as nanopillars, slanted posts, zigzag columns, spirals, etc.6-8) These nanostructures can be used in a variety of fields, e.g., photonic crystals, magnetic storage media, and optoelectronic devices, etc.9-14) For example, arrays of Ag nanorods can be used as surface-enhanced Raman scattering substrates, and Rhodamine 6G molecules can be detected to a concentration limit of 10 À14 mol/L by this substrate. 15,16) Arrays of HfO 2 nanocolumns can be used as antireflection coating, and the antireflection rate can be adjust by GLAD conditions.
17)In this letter, we report our effort to build a simple model which is called hemisphere growth model to study the rule of glancing angle deposition. Influence of experiment conditions such as incidence angle, incidence rate, substrate temperature, and substrate rotation rate are theoretical analyzed by the hemisphere growth model, and validated respectively by amount of experiment. As an application of the model, metals of different melting point were deposited into coherent multi-section nanorods by adjusting substrate temperature.When deposition at oblique angles, after nucleation and initial growth, columns format following the structure zone model. 3,5) According to the structure zone model, when substrate temperature is lower than 0.3 melting point of target material, the film microstructure is composed of tapered columns with domed tops, and GLAD principally relies on these structures. On the basis of this, we build a model that incident vapor flux nucleates on the substrates and grows into close-packing hemispheres, and in GLAD process nanostructures grow from these hemispheres.It is well known that atomic shadowing and adatom diffusion are the dominate growth mechanisms in GLAD. When depositing at oblique angles, one hemisphere will form a shadow to nearby hemispheres as shown in Fig. 1. The diameter D of hemispheres is related to the temperature of the substrates when they form and the melting point of the material. Th...