1995
DOI: 10.1063/1.113442
|View full text |Cite
|
Sign up to set email alerts
|

Novel pseudoalloy approach to epitaxial growth of complex InGaAlAs multilayer structures

Abstract: Articles you may be interested inGrowth of high density self-organized (In,Ga)As quantum dots with ultranarrow photoluminescence linewidths using buried In(Ga,Al)As stressor dots

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

1996
1996
2024
2024

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 4 publications
0
1
0
Order By: Relevance
“…The properties of these SPSLs resemble those of random alloys of similar compositions [1]. SPSL materials have been shown to be an attractive replacement for ternary [2] and quaternary [3,4] alloys in device applications due to the ability to suppress the propagation of defects [5,6] and the highly advantageous ability to change alloy effective composition without source temperature changes during molecular beam epitaxy (MBE) growth. Recently, the wide-bandgap Zn x Cd 1–x Se/Zn x Cd y Mg 1–x–y Se material system lattice matched to InP has been shown to be an excellent candidate for several novel device applications.…”
Section: Introductionmentioning
confidence: 99%
“…The properties of these SPSLs resemble those of random alloys of similar compositions [1]. SPSL materials have been shown to be an attractive replacement for ternary [2] and quaternary [3,4] alloys in device applications due to the ability to suppress the propagation of defects [5,6] and the highly advantageous ability to change alloy effective composition without source temperature changes during molecular beam epitaxy (MBE) growth. Recently, the wide-bandgap Zn x Cd 1–x Se/Zn x Cd y Mg 1–x–y Se material system lattice matched to InP has been shown to be an excellent candidate for several novel device applications.…”
Section: Introductionmentioning
confidence: 99%