Novel Synthesis of Metal Nanowhiskers: High-Temperature Glancing Angle Deposition

Suzuki, Motofumi; Hamachi, Kenji; Nagai, Koutatsu; Kita, Ryo; Nakajima, K.; Kimura, Kenji

doi:10.1557/proc-1058-jj03-09

Cited by 3 publications

(4 citation statements)

References 5 publications

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“…In the past, nanowhiskers of various other metals have also been grown by HT-GLAD. (2,3) The following conditions must be satisfied for growing nanowhiskers: (i) the deposition temperature must be higher than approximately one-third of the melting point of the metal and (ii) the deposition angle must be typically larger than 80°. Thus, the HT-GLAD growth process is highly sensitive to deposition conditions.…”

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confidence: 99%

Growth of Metal Nanowhiskers on Patterned Substrate by High Temperature Glancing Angle Deposition

Suzuki

Kita

Hara

et al. 2010

J. Electrochem. Soc.

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In this study, we carry out high temperature glancing angle deposition (HT-GLAD) of Fe and Al on a heated substrate with trench patterns. When vapor is incident perpendicular to the trench direction, nanowhiskers grow only on the surface exposed to the vapor and not inside the trenches. When vapor is incident at a deposition angle larger than 80° on the sidewall of the trench and not on the substrate surface, nanowhiskers grow only on the sidewall because the condition of deposition at a high temperature and a large deposition angle is satisfied only for the sidewall. Thus, we succeed in the selective growth of nanowhiskers by controlling the geometrical deposition conditions. Further, we also discuss the effect of the local deposition geometry on the growth process.Geometrically selective growth by HT-GLAD is expected to be useful for growing nanowhiskers on nano-and microstructured substrates.

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confidence: 99%

Growth of Metal Nanowhiskers on Patterned Substrate by High Temperature Glancing Angle Deposition

Suzuki

Kita

Hara

et al. 2010

J. Electrochem. Soc.

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“…This process is termed high-temperature glancing angle deposition (HT-GLAD). In the past, nanowhiskers of various other metals have also been grown by HT-GLAD (2,3). The following conditions must be satisfied for growing nanowhiskers: (a) the deposition temperature must be higher than approximately one-third of the melting point of the metal and (b) the glancing deposition angle must be larger than 80°.…”

Section: Introductionmentioning

confidence: 99%

Growth of Metal Nanowhiskers on Patterned Substrate by High-Temperature Glancing Angle Deposition

Suzuki¹,

Hara²,

Kita³

et al. 2009

ECS Trans.

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In this study, we carry out high-temperature glancing angle deposition (HT-GLAD) of Fe and Al on a heated substrate with trench patterns. When vapor is incident perpendicular to the trench direction, nanowhiskers grow only on the surface exposed to the vapor and not inside the trenches. On the other hand, when vapor is incident at a glancing angle on the sidewall of the trench and not on the substrate surface, nanowhiskers grow only on the sidewall, since the condition of deposition at high temperature and a glancing angle is satisfied only for the sidewall. Thus, we succeed the selective growth of nanowhiskers by controlling the geometrical deposition conditions. Further, we also discuss the effect of the local deposition geometry on the growth process. Geometrically selective growth by HT-GLAD is expected to be useful for growing nanowhiskers on nano- and microstructured substrates.

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“…The average thicknesses of the deposited metals are 60 nm (for Al), 72 nm (for Ag and Au), and 100 nm (for Fe). 12) The deposition angles are 85°for Al, Ag and Au, while that for Fe is 82°. .…”

mentioning

confidence: 99%

“…ように，太さ数10～数100 nm，長さ10 mm に達するナノウィスカが成長する．これらの試料は400°C前後に加熱した薄膜上に蒸着角80°以上で重量膜厚に換算して100 nm 以下の量の Al10,11) および，Ag, Au, Fe12) …”

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Vapor Phase Growth of Metal Nanowhiskers Induced by Glancing Angle Deposition at High Temperature

Suzuki¹

2009

J. Vac. Soc. Jpn.

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We demonstrate the growth of unusual metal nanowhiskers by glancing angle deposition on a high temperature (HT GLAD) substrate, while the usual nanocolumnar structures completely disappear due to accelerated surface diŠusion. HT GLAD is essential for the nucleation of the nanowhiskers and e‹cient supply of metal atoms on the side surface of the vertically growing nanowhiskers. HT GLAD will, for theˆrst time, reveal the mechanisms for the vapor growth of metal whiskers and be useful to produce high-quality metal nanowires for novel device elements. . はじめに

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Novel Synthesis of Metal Nanowhiskers: High-Temperature Glancing Angle Deposition

Cited by 3 publications

References 5 publications

Growth of Metal Nanowhiskers on Patterned Substrate by High Temperature Glancing Angle Deposition

Growth of Metal Nanowhiskers on Patterned Substrate by High Temperature Glancing Angle Deposition

Growth of Metal Nanowhiskers on Patterned Substrate by High-Temperature Glancing Angle Deposition

Vapor Phase Growth of Metal Nanowhiskers Induced by Glancing Angle Deposition at High Temperature

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