2011
DOI: 10.1016/j.jnoncrysol.2011.02.042
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Nucleation and grain growth in as deposited and ion implanted GeTe thin films

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Cited by 21 publications
(17 citation statements)
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“…Thus, the decrease in the effective activation energy for crystallization of GeTe observed for increasing deposition temperatures is primarily due to a reduction in the activation energy for nucleation. Similar activation energies for nucleation and growth of films deposited at room temperature have been reported elsewhere using a different technique [10,30]. Films deposited at room temperature experience a higher effective quench rate as compared to films deposited at higher temperatures [31].…”
Section: Resultssupporting
confidence: 72%
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“…Thus, the decrease in the effective activation energy for crystallization of GeTe observed for increasing deposition temperatures is primarily due to a reduction in the activation energy for nucleation. Similar activation energies for nucleation and growth of films deposited at room temperature have been reported elsewhere using a different technique [10,30]. Films deposited at room temperature experience a higher effective quench rate as compared to films deposited at higher temperatures [31].…”
Section: Resultssupporting
confidence: 72%
“…4 a The local effective activation energy E c as a function of the fraction transformed a for films prepared at various deposition temperatures and b activation energies for nucleation and growth as a function of the deposition temperature homopolar Te-Te bonds in the as-deposited state. It is known that homopolar Te-Te bonds are forbidden in the crystalline structure [10]. It has therefore been suggested that the presence of these homopolar Te-Te bonds might retard the crystallization process [9].…”
Section: Resultsmentioning
confidence: 99%
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