Local laser oxidation of thin metal films allows recording of an optical image on thin films with the highest resolution and high productivity at the same time, and without distortions specific to laser ablation. A technique for writing of diffractive optical elements was developed on the basis of this process. Laser-matter interaction physics and laser technology underlying this method are described in this chapter.
IntroductionIn our opinion, laser oxidation of thin metal films is a successful example of the discovery of a new effect, its explanation and application. Furthermore, although all these developments took place at the beginning of the laser era, the interest in these has not decayed up to now, not to mention a new technique (short-pulse laser writing), at this point, a new physics was also required due to the coming of the "nano" era.Let us briefly describe these developments in the introduction because the authors were their direct participants. The effect that formed the basis of the research field under discussion was first observed in our experiments aimed to determine the evaporation thresholds q ev of thin chromium films exposed in the optical projection