Numerical and Experimental Analysis of Intermittent Line-and-Space Patterns in Thermal Nanoimprint

Ônishi, Yoshihiro; Takagi, Hideki; Hirai,; Takahashi, Daisuke; Maeda$^{, }$; Tanabe,; Iriye,

doi:10.1109/imnc.2007.4456294

Cited by 4 publications

(5 citation statements)

References 3 publications

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“…In a Lagrangian or ALE framework the free surface is a moving boundary of the domain and the contact is relatively easy handled by assuming, for example, sticky conditions (velocity of the fluid becomes equal to the velocity of the wall) if a node on the surface tries to cross the wall. This is nicely described in a recent paper by Dimakopoulos and Tsamopoulos [7] (see also [8][9][10]). In a Lagrangian or ALE framework the interface between the two phases (liquid and solid) is aligned with element boundaries.…”

Section: Introductionsupporting

confidence: 63%

Numerical simulation of the fountain flow instability in injection molding

Baltussen

Hulsen

Peters

2010

Journal of Non-Newtonian Fluid Mechanics

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Section: Introductionsupporting

confidence: 63%

Numerical simulation of the fountain flow instability in injection molding

Baltussen

Hulsen

Peters

2010

Journal of Non-Newtonian Fluid Mechanics

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“…Onishi et al reported that the external lines are easier to be filled than the internal lines as a similar example. 10) Imprinting shows a tendency of filling the patterns from each end and moving toward the center of patterns.…”

Section: Glass Nanoimprintingmentioning

confidence: 99%

Fabrication of Glassy Carbon Molds Using Hydrogen Silsequioxane Patterned by Electron Beam Lithography as O₂ Dry Etching Mask

Yasui

Sugiyama²,

Takahashi

et al. 2008

jjap

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Glass is a good candidate material for optical devices because of its enhanced optical properties, the technique of die machining has not been established for the hot embossing of glass. In this study, we used the glassy carbon (GC) mold for the hot embossing of glass. An inductively coupled plasma reactive ion etching (ICP-RIE) using oxygen plasma was employed for the submicron structuring of the GC mold. Hydrogen silsesquioxane (HSQ) is a negative-type electron beam (EB) resist used to be resistant to oxygen plasma. HSQ patterns drawn by electron beam lithography (EBL) were used as the O 2 dry etching mask. The etching selectivity between HSQ and GC was 35. The average of the extent of side etching was 40 nm at a depth of 300 nm. The side etching functioning as the draft angle was caused mainly by oxygen radicals, because HSQ patterns remained even after GC patterns were side-etched. We confirmed that the GC mold fabricated by O 2 dry etching can be used for glass hot embossing. Since the mold lubricant was not rubbed on the mold surface, GC is the appropriate mold material for Pyrex glass.

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“…Recently we have developed a finite element numerical simulator to analyze the thermal nanoimprint processes. [4][5][6][7][8][9][10] We employed a viscoelastic model based on the generalized Maxwell model and the Williams-Landel-Ferry (WLF) law as the constitutive model of polymers. The calculated timeevolutional polymer deformation was in good agreement with experimental results.…”

Section: Introductionmentioning

confidence: 99%

Numerical and Experimental Analysis of Intermittent Line-and-Space Patterns in Thermal Nanoimprint

Ônishi

Takagi

Takahashi

et al. 2008

jjap

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Time-evolutional analyses of an intermittent line-and-space patterning in thermal nanoimprint were performed both experimentally and numerically. The constitutive model of polymers in finite element numerical analyses was a viscoelastic model based on the generalized Maxwell model and the Williams-Landel-Ferry (WLF) law so that polymer deformation was strain-history and temperature dependent. We performed uniaxial vibrational tests and numerical inverse analyses to identify material properties of the viscoelastic model for cyclo-olefin-polymer (COP). We also carried out a series of experiments and numerical simulations of an intermittent line-and-space patterning at various pressure-holding times. Both experiments and simulations presented characteristic polymer deformation which never appear in continuous line-and-space patterning. The numerical simulation well agreed with experiments and revealed complicated distributions of stress and pressure during the imprinting that were difficult to be directly observed in thermal nanoimprint experiments.

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Numerical and Experimental Analysis of Intermittent Line-and-Space Patterns in Thermal Nanoimprint

Cited by 4 publications

References 3 publications

Numerical simulation of the fountain flow instability in injection molding

Numerical simulation of the fountain flow instability in injection molding

Fabrication of Glassy Carbon Molds Using Hydrogen Silsequioxane Patterned by Electron Beam Lithography as O₂ Dry Etching Mask

Numerical and Experimental Analysis of Intermittent Line-and-Space Patterns in Thermal Nanoimprint

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Numerical and Experimental Analysis of Intermittent Line-and-Space Patterns in Thermal Nanoimprint

Cited by 4 publications

References 3 publications

Numerical simulation of the fountain flow instability in injection molding

Numerical simulation of the fountain flow instability in injection molding

Fabrication of Glassy Carbon Molds Using Hydrogen Silsequioxane Patterned by Electron Beam Lithography as O2 Dry Etching Mask

Numerical and Experimental Analysis of Intermittent Line-and-Space Patterns in Thermal Nanoimprint

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Fabrication of Glassy Carbon Molds Using Hydrogen Silsequioxane Patterned by Electron Beam Lithography as O₂ Dry Etching Mask